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G. Aresta, J. Palmans, M.CM van de Sanden, M. CreatoreInitiated-chemical vapor deposition of organosilicon layers: Monomer adsorption, bulk growth, and process window definition, J. Vac. Sci. Technol. A 30 (2012) 11.
F. Law, B. Hoex, J. Wang, J. Luther, K. Sharma, M. Creatore, M.CM van de SandenKinetic study of solid phase crystallisation of expanding thermal plasma deposited a-Si:H, Thin Solid Films 520 (2012) 5820-5825.
M.V Ponomarev, K. Sharma, M.A Verheijen, M.CM van de Sanden, M. CreatoreImproved conductivity of aluminum-doped ZnO: The effect of hydrogen diffusion from a hydrogenated amorphous silicon capping layer, J. Appl. Phys. 111 (2012) 063715.
G. Aresta, J. Palmans, M.CM van de Sanden, M. CreatoreEvidence of the filling of nano-porosity in SiO2-like layers by an initiated-CVD monomer, Microporous Mesoporous Mat. 151 (2012) 434-439.
K. Sharma, M.V Ponomarev, M.A Verheijen, O. Kunz, F.D Tichelaar, M.CM van de Sanden, M. CreatoreSolid-phase crystallization of ultra high growth rate amorphous silicon films, J. Appl. Phys. 111 (2012) 5.
M.V Ponomarev, M.A Verheijen, W. Keuning, M.CM van de Sanden, M. CreatoreControlling the resistivity gradient in aluminum-doped zinc oxide grown by plasma-enhanced chemical vapor deposition (vol 112, 043708, 2012), J. Appl. Phys. 6112 (2012) 1.