Publications

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1998
A.P Shevelko, L.A Shmaenok, S.S Churilov, R Bastiaensen, F. Bijkerk,  Extreme ultraviolet spectroscopy of a laser plasma source for lithography, Physica Scripta 257 (1998) 276-282.
1996
F. Bijkerk, L.A Shmaenok, E. Louis, H.J Voorma, N.B Koster, C. Bruineman, R Bastiaensen, E.WJM van der Drift, J. Romijn, L.EM de Groot et al.,  Extreme UV lithography: A new laser plasma target concept and fabrication of multilayer reflection masks, Microelectronic Engineering 1-430 (1996) 183-186.