Publications

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Journal Article
T. Tsarfati, R de Kruijs, E. Zoethout, E. Louis, F. BijkerkReflective multilayer optics for 6.7 nm wavelength radiation sources and next generation lithography, Thin Solid Films 5518 (2009) 1365-1368.
J.Q Chen, E. Louis, J. Verhoeven, R. Harmsen, C.J Lee, M. Lubomska, M. van Kampen, W. van Schaik, F. BijkerkSecondary electron yield measurements of carbon covered multilayer optics, Appl. Surf. Sci. 2257 (2010) 354-361.
I.A Makhotkin, E. Zoethout, R. van de Kruijs, S.N Yakunin, E. Louis, A.M Yakunin, V. Banine, S. Mullender, F. BijkerkShort period La/B and LaN/B multilayer mirrors for similar to 6.8 nm wavelength, Opt. Express 2421 (2013) 29894-29904.
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A.R Khorsand, R. Sobierajski, E. Louis, S. Bruijn, E.D van Hattum, R.WE van de Kruijs, M. Jurek, D. Klinger, J.B Pelka, L. Juha et al.Single shot damage mechanism of Mo/Si multilayer optics under intense pulsed XUV-exposure, Opt. Express 218 (2010) 700-712.
E. Louis, F. Bijkerk, L. Shmaenok, H.J Voorma, M.J van der Wiel, R. Schlatmann, J. Verhoeven, E.WJM van der Drift, J. Romijn, B.AC Rousseeuw et al.Soft-X-Ray Projection Lithography Using a High-Repetition-Rate Laser-Induced X-Ray Source for Sub-100 Nanometer Lithography Processes, Microelectronic Engineering 1-421 (1993) 67-70.
I.A Makhotkin, E. Zoethout, E. Louis, A.M Yakunin, S. Mullender, F. BijkerkSpectral properties of La/B - based multilayer mirrors near the boron K absorption edge, Opt. Express 20 (2012) 11778-11786.
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M van Herpen, R de Kruijs, D.JW Klunder, E. Louis, A.E Yakshin, A S. van der Westen, F. Bijkerk, V. BanineSpectral-purity-enhancing layer for multilayer mirrors, Opt. Lett. 633 (2008) 560-562.
A.JR van den Boogaard, E. Louis, E. Zoethout, S. Mullender, F. BijkerkSurface morphology of Kr+-polished amorphous Si layers, J. Vac. Sci. Technol. A 428 (2010) 552-558.
H.J Voorma, E. Louis, N.B Koster, F. BijkerkTemperature induced diffusion in Mo/Si multilayer mirrors, Journal of Applied Physics 983 (1998) 4700-4708.
I. Makhotkin, E. Zoethout, E. Louis, A.M Yakunin, S. Muellender, F. BijkerkWavelength selection for multilayer coatings for lithography generation beyond extreme ultraviolet, J. Micro-Nanolithogr. MEMS MOEMS 411 (2012) 040501.
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A.JR van den Boogaard, F.A van Goor, E. Louis, F. BijkerkWavelength separation from extreme ultraviolet mirrors using phaseshift reflection, Opt. Lett. 237 (2012) 160-162.
S.S Ellwi, L. Juschkin, S. Ferri, H.J Kunze, K.N Koshelev, E. LouisX-ray lasing as a result of an induced instability in an ablative capillary discharge, Journal of Physics D-Applied Physics 334 (2001) 336-339.

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