Publications

Export 53 results:
Author Title Type [ Year(Asc)]
Filters: Author is E. Louis  [Clear All Filters]
1999
R. Stuik, E. Louis, A.E Yakshin, P.C Gorts, E.LG Maas, F. Bijkerk, D. Schmitz, F. Scholze, G. Ulm, M. Haidl,  Peak and Integrated reflectivity, wavelength and gamma optimization of Mo/Si, and Mo/Be multilayer, multielement optics for extreme ultraviolet lithography, Journal of Vacuum Science & Technology B 617 (1999) 2998-3002.
1998
H.J Voorma, E. Louis, N.B Koster, F. Bijkerk,  Temperature induced diffusion in Mo/Si multilayer mirrors, Journal of Applied Physics 983 (1998) 4700-4708.
1997
H.J Voorma, E. Louis, F. Bijkerk, S. Abdali,  Angular and energy dependence of ion bombardment of Mo/Si multilayers, Journal of Applied Physics 482 (1997) 1876-1881.
H.J Voorma, E. Louis, N.B Koster, F. Bijkerk, T. Zijlstra, L.EM de Groot, B.AC Rousseeuw, J. Romijn, E.WJM van der Drift, J. Friedrich,  Fabrication and analysis of extreme ultraviolet reflection masks with patterned W/C absorber bilayers, Journal of Vacuum Science & Technology B 215 (1997) 293-298.
H.J Voorma, E. Louis, N.B Koster, F. Bijkerk, E. Spiller,  Characterization of multilayers by Fourier analysis of x-ray reflectivity, Journal of Applied Physics 981 (1997) 6112-6119.
1996
F. Bijkerk, L.A Shmaenok, E. Louis, H.J Voorma, N.B Koster, C. Bruineman, R Bastiaensen, E.WJM van der Drift, J. Romijn, L.EM de Groot et al.,  Extreme UV lithography: A new laser plasma target concept and fabrication of multilayer reflection masks, Microelectronic Engineering 1-430 (1996) 183-186.
H.J Voorma, G.E van Dorssen, E. Louis, N.B Koster, A.D Smith, M.D Roper, F. Bijkerk,  EXAFS measurements on the structure of Mo/Si multilayers produced using ion bombardment and increased deposition temperature, Applied Surface Science 393 (1996) 221-230.
1995
E. Louis, H.J Voorma, N.B Koster, F. Bijkerk, Y.Y Platonov, S.Y Zuev, S.S Andreev, E.A Shamov, N.N Salashchenko,  Multilayer Coated Reflective Optics for Extreme Uv Lithography, Microelectronic Engineering 1-427 (1995) 235-238.
1994
E. Louis, H.J Voorma, N.B Koster, L. Shmaenok, F. Bijkerk, R. Schlatmann, J. Verhoeven, Y.Y Platonov, G.E van Dorssen, H.A Padmore,  Enhancement of Reflectivity of Multilayer Mirrors for Soft-X-Ray Projection Lithography by Temperature Optimization and Ion-Bombardment, Microelectronic Engineering 1-423 (1994) 215-218.
F. Bijkerk, E. Louis, G.E van Dorssen, A.P Shevelko, A.A Vasilyev,  Absolute Brightness of Laser Plasmas in the Soft-X-Ray Emission Band, Applied Optics 133 (1994) 82-88.
1993
E. Louis, F. Bijkerk, L. Shmaenok, H.J Voorma, M.J van der Wiel, R. Schlatmann, J. Verhoeven, E.WJM van der Drift, J. Romijn, B.AC Rousseeuw et al.,  Soft-X-Ray Projection Lithography Using a High-Repetition-Rate Laser-Induced X-Ray Source for Sub-100 Nanometer Lithography Processes, Microelectronic Engineering 1-421 (1993) 67-70.
1992
G.E van Dorssen, E. Louis, F. Bijkerk,  Optimization of X-Ray-Emission from a Laser-Produced Plasma in a Narrow Wavelength Band, Laser and Particle Beams 410 (1992) 759-765.
F. Bijkerk, E. Louis, E.CI Turcu, G.J Tallents,  High Repetition Rate Krf Laser Plasma X-Ray Source for Microlithography, Microelectronic Engineering 1-417 (1992) 219-222.

Pages