Publications
Peak and Integrated reflectivity, wavelength and gamma optimization of Mo/Si, and Mo/Be multilayer, multielement optics for extreme ultraviolet lithography, Journal of Vacuum Science & Technology B 617 (1999) 2998-3002.
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Temperature induced diffusion in Mo/Si multilayer mirrors, Journal of Applied Physics 983 (1998) 4700-4708.
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Angular and energy dependence of ion bombardment of Mo/Si multilayers, Journal of Applied Physics 482 (1997) 1876-1881.
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Fabrication and analysis of extreme ultraviolet reflection masks with patterned W/C absorber bilayers, Journal of Vacuum Science & Technology B 215 (1997) 293-298.
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Characterization of multilayers by Fourier analysis of x-ray reflectivity, Journal of Applied Physics 981 (1997) 6112-6119.
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Extreme UV lithography: A new laser plasma target concept and fabrication of multilayer reflection masks, Microelectronic Engineering 1-430 (1996) 183-186.
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EXAFS measurements on the structure of Mo/Si multilayers produced using ion bombardment and increased deposition temperature, Applied Surface Science 393 (1996) 221-230.
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Multilayer Coated Reflective Optics for Extreme Uv Lithography, Microelectronic Engineering 1-427 (1995) 235-238.
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Enhancement of Reflectivity of Multilayer Mirrors for Soft-X-Ray Projection Lithography by Temperature Optimization and Ion-Bombardment, Microelectronic Engineering 1-423 (1994) 215-218.
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Absolute Brightness of Laser Plasmas in the Soft-X-Ray Emission Band, Applied Optics 133 (1994) 82-88.
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Soft-X-Ray Projection Lithography Using a High-Repetition-Rate Laser-Induced X-Ray Source for Sub-100 Nanometer Lithography Processes, Microelectronic Engineering 1-421 (1993) 67-70.
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Optimization of X-Ray-Emission from a Laser-Produced Plasma in a Narrow Wavelength Band, Laser and Particle Beams 410 (1992) 759-765.
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High Repetition Rate Krf Laser Plasma X-Ray Source for Microlithography, Microelectronic Engineering 1-417 (1992) 219-222.
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