Publications

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K. Sharma, M.V Ponomarev, M.A Verheijen, O. Kunz, F.D Tichelaar, M.CM van de Sanden, M. CreatoreSolid-phase crystallization of ultra high growth rate amorphous silicon films, J. Appl. Phys. 111 (2012) 5.
K. Bystrov, M.CM van de Sanden, C. Arnas, L. Marot, D. Mathys, F. Liu, L.K. Xu, X.B. Li, A.V. Shalpegin, G. De TemmermanSpontaneous synthesis of carbon nanowalls, nanotubes and nanotips using high flux density plasmas, Carbon 68 (2014) 695-707.
OA PDF icon 2014_55728.pdf (2.07 MB)
H.B Profijt, M.CM van de Sanden, W.MM KesselsSubstrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO(2) Thin Films, Electrochem. Solid State Lett. 15 (2012) G1-G3.
H.B Profijt, M.CM van de Sanden, W.MM KesseleSubstrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth, J. Vac. Sci. Technol. A 31 (2013) 9.
P.A Premkumar, S.A Starostin, H. de Vries, M. Creatore, P.M Koenraad, W.A MacDonald, M.CM van de SandenSurface Dynamics of SiO2-like Films on Polymers Grown by DBD Assisted CVD at Atmospheric Pressure, Plasma Processes Polym. 11-129 (2012) 1194–1207.
B.N Jariwala, N.J Kramer, M.C Petcu, D.C Bobela, M.CM van de Sanden, P. Stradins, C.V Ciobanu, S. AgarwalSurface Hydride Composition of Plasma-Synthesized Si Nanoparticles, J. Phys. Chem. C 115 (2011) 20375-20379.
I. Tanyeli, L. Marot, D. Mathys, M.CM van de Sanden, G.C De TemmermanSurface Modifications Induced by High Fluxes of Low Energy Helium Ions, Sci. Rep. 5 (2015) 9779.
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B. Hoex, M.CM van de Sanden, J. Schmidt, R. Brendel, W.MM KesselsSurface passivation of phosphorus-diffused n(+)-type emitters by plasma-assisted atomic-layer deposited Al2O3, Phys. Status Solidi-Rapid Res. Lett. 6 (2012) 4-6.
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M.CM van de Sanden, M Dimitrova, C GhelevVEIT 2014, J. Phys.: Conf. Ser. 1514 (2014) 011001.
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