Publications

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Journal Article
A.C Bronneberg, M.CM van de Sanden, M. CreatoreRemote plasma deposition of microcrystalline silicon thin-films: Film structure and the role of atomic hydrogen, J. Non-Cryst. Solids 358 (2012) 379-386.
N. den Harder, D.C. Schram, W.J Goedheer, H.J de Blank, M.CM van de Sanden, G.J van RooijResidual gas entering high density hydrogen plasma: rarefaction due to rapid heating, Plasma Sources Sci. Technol. 224 (2015) 025020.
OA PDF icon 2015_61228.pdf (712.02 KB)
A. Perrotta, E.RJ van Beekum, G. Aresta, A. Jagia, W. Keuning, M.CM van de Sanden, W.MM Kessels, M. CreatoreOn the role of nanoporosity in controlling the performance of moisture permeation barrier layers, Microporous and Mesoporous Materials 188 (2014) 163-171.
K. Sharma, M.V Ponomarev, M.A Verheijen, O. Kunz, F.D Tichelaar, M.CM van de Sanden, M. CreatoreSolid-phase crystallization of ultra high growth rate amorphous silicon films, J. Appl. Phys. 111 (2012) 5.
K. Bystrov, M.CM van de Sanden, C. Arnas, L. Marot, D. Mathys, F. Liu, L.K. Xu, X.B. Li, A.V. Shalpegin, G. De TemmermanSpontaneous synthesis of carbon nanowalls, nanotubes and nanotips using high flux density plasmas, Carbon 68 (2014) 695-707.
OA PDF icon 2014_55728.pdf (2.07 MB)
H.B Profijt, M.CM van de Sanden, W.MM KesselsSubstrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO(2) Thin Films, Electrochem. Solid State Lett. 15 (2012) G1-G3.
H.B Profijt, M.CM van de Sanden, W.MM KesseleSubstrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth, J. Vac. Sci. Technol. A 31 (2013) 9.
P.A Premkumar, S.A Starostin, H. de Vries, M. Creatore, P.M Koenraad, W.A MacDonald, M.CM van de SandenSurface Dynamics of SiO2-like Films on Polymers Grown by DBD Assisted CVD at Atmospheric Pressure, Plasma Processes Polym. 11-129 (2012) 1194–1207.
B.N Jariwala, N.J Kramer, M.C Petcu, D.C Bobela, M.CM van de Sanden, P. Stradins, C.V Ciobanu, S. AgarwalSurface Hydride Composition of Plasma-Synthesized Si Nanoparticles, J. Phys. Chem. C 115 (2011) 20375-20379.
I. Tanyeli, L. Marot, D. Mathys, M.CM van de Sanden, G.C De TemmermanSurface Modifications Induced by High Fluxes of Low Energy Helium Ions, Sci. Rep. 5 (2015) 9779.
OA 
B. Hoex, M.CM van de Sanden, J. Schmidt, R. Brendel, W.MM KesselsSurface passivation of phosphorus-diffused n(+)-type emitters by plasma-assisted atomic-layer deposited Al2O3, Phys. Status Solidi-Rapid Res. Lett. 6 (2012) 4-6.
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G. van Rooij, D. van den Bekerom, N. den Harder, T. Minea, G. Berden, W. Bongers, R. Engeln, M. Graswinckel, E. Zoethout, M.CM van de SandenTaming microwave plasma to beat thermodynamics in CO2 dissociation, Faraday Discuss. 178 (2015) 233-248.
OA PDF icon 2015_62764.pdf (2.07 MB)
S.A Starostin, M. Creatore, J.B Bouwstra, M.CM van de Sanden, H.W de VriesTowards Roll-to-Roll Deposition of High Quality Moisture Barrier Films on Polymers by Atmospheric Pressure Plasma Assisted Process, Plasma Processes Polym. 612 (2015) 545-554.
OA PDF icon 2015_62758.pdf (2.19 MB)
I. Dogan, N.J Kramer, R.HJ Westermann, K. Dohnalova, A.HM Smets, M.A Verheijen, T. Gregorkiewicz, M.CM van de SandenUltrahigh throughput plasma processing of free standing silicon nanocrystals with lognormal size distribution, J. Appl. Phys. 13113 (2013) 134306.
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M.CM van de Sanden, M Dimitrova, C GhelevVEIT 2014, J. Phys.: Conf. Ser. 1514 (2014) 011001.
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D. Sahin, A. Gaggero, J.W Weber, I. Agafonov, M.A Verheijen, F. Mattioli, J. Beetz, M. Kamp, S. Hofling, M.CM van de Sanden et al.Waveguide Nanowire Superconducting Single-Photon Detectors Fabricated on GaAs and the Study of Their Optical Properties, IEEE J. Sel. Top. Quant. Electron. 221 (2015) 3800210.

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