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M.L Grecea, M.A Gleeson, W. van Schaik, A.W Kleyn, F. BijkerkCo-adsorption of NH(3) and SO(2) on quartz(0001): Formation of a stabilized complex, Chem. Phys. Lett. 4-6511 (2011) 270-276.
S. Bruijn, R.WE van de Kruijs, A.E Yakshin, F. BijkerkIn-situ study of the diffusion-reaction mechanism in Mo/Si multilayered films, Appl. Surf. Sci. 257 (2011) 2707-2711.
R. Sobierajski, S. Bruijn, A.R Khorsand, E. Louis, R de Kruijs, T. Burian, J. Chalupsky, J. Cihelka, A. Gleeson, J. Grzonka et al.Damage mechanisms of MoN/SiN multilayer optics for next-generation pulsed XUV light sources, Opt. Express 119 (2011) 193-205.
V de Rooij-Lohmann, A.E Yakshin, E. Zoethout, J. Verhoeven, F. BijkerkReduction of interlayer thickness by low-temperature deposition of Mo/Si multilayer mirrors for X-ray reflection, Appl. Surf. Sci. 257 (2011) 6251-6255.
A. Rouzee, P. Johnsson, E.V Gryzlova, H. Fukuzawa, A. Yamada, W. Siu, Y. Huismans, E. Louis, F. Bijkerk, D.MP Holland et al.Angle-resolved photoelectron spectroscopy of sequential three-photon triple ionization of neon at 90.5 eV photon energy, Phys. Rev. A 83 (2011) 031401.
I.V Kozhevnikov, R. van der Meer, H.MJ Bastiaens, K.J Boller, F. BijkerkAnalytic theory of soft x-ray diffraction by lamellar multilayer gratings, Opt. Express 1019 (2011) 9172-9184.
M.L Grecea, M.A Gleeson, W. van Schaik, A.W Kleyn, F. BijkerkErratum to 'Co-adsorption of NH(3) and SO(2) on quartz(0 0 0 1): Formation of a stabilized complex (vol 511, pg 270, 2011)', Chem. Phys. Lett. 1-3516 (2011) 111-111.
I.A Makhotkin, E. Louis, R.WE van de Kruijs, A.E Yakshin, E. Zoethout, A.Y Seregin, E.Y Tereschenko, S.N Yakunin, F. BijkerkDetermination of the density of ultrathin La films in La/B(4)C layered structures using X-ray standing waves, Phys. Status Solidi A-Appl. Mat. 11208 (2011) 2597-2600.
E. Louis, A.E Yakshin, T. Tsarfati, F. BijkerkNanometer interface and materials control for multilayer EUV-optical applications, Prog. Surf. Sci. 86 (2011) 255-294.
J.Q Chen, E. Louis, R. Harmsen, T. Tsarfati, H. Wormeester, M. van Kampen, W. van Schaik, R. van de Kruijs, F. BijkerkIn situ ellipsometry study of atomic hydrogen etching of extreme ultraviolet induced carbon layers, Appl. Surf. Sci. 258 (2011) 7-12.
J.Q Chen, E. Louis, H. Wormeester, R. Harmsen, R. van de Kruijs, C.J Lee, W. van Schaik, F. BijkerkCarbon-induced extreme ultraviolet reflectance loss characterized using visible-light ellipsometry, Meas. Sci. Technol. 22 (2011) 105705.
R.A Loch, A. Dubrouil, R. Sobierajski, D. Descamps, B. Fabre, P. Lidon, R.WE van de Kruijs, F. Boekhout, E. Gullikson, J. Gaudin et al.Phase characterization of the reflection on an extreme UV multilayer: comparison between attosecond metrology and standing wave measurements, Opt. Lett. 36 (2011) 3386-3388.
V.V Medvedev, A.E Yakshin, R.WE van de Kruijs, V.M Krivtsun, A.M Yakunin, K.N Koshelev, F. BijkerkInfrared suppression by hybrid EUV multilayer-IR etalon structures, Opt. Lett. 36 (2011) 3344-3346.
A.JR van den Boogaard, E. Louis, E. Zoethout, K.A Goldberg, F. BijkerkCharacterization of Mo/Si multilayer growth on stepped topographies, J. Vac. Sci. Technol. B 29 (2011) 6.
A.S Kuznetsov, R.WE van de Kruijs, M.A Gleeson, K. Schmid, F. BijkerkHydrogen interaction with EUVL-relevant optical materials, J. Surf. Ingestig.-X-Ray Synchro. 44 (2010) 563-566.
S. Bruijn, R.WE van de Kruijs, A.E Yakshin, E. Zoethout, F. BijkerkThermally induced decomposition of B4C barrier layers in Mo/Si multilayer structures, Surf. Coat. Technol. 7205 (2010) 2469-2473.
A.R Khorsand, R. Sobierajski, E. Louis, S. Bruijn, E.D van Hattum, R.WE van de Kruijs, M. Jurek, D. Klinger, J.B Pelka, L. Juha et al.Single shot damage mechanism of Mo/Si multilayer optics under intense pulsed XUV-exposure, Opt. Express 218 (2010) 700-712.
I.V Kozhevnikov, R. van der Meer, H.MJ Bastiaens, K.J Boller, F. BijkerkHigh-resolution, high-reflectivity operation of lamellar multilayer amplitude gratings: identification of the single-order regime, Opt. Express 1518 (2010) 16234-16242.
V de Rooij-Lohmann, A.E Yakshin, R.WE van de Kruijs, E. Zoethout, A.W Kleyn, E.G Keim, M. Gorgoi, F. Schafers, H.H Brongersma, F. BijkerkEnhanced diffusion upon amorphous-to-nanocrystalline phase transition in Mo/B4C/Si layered systems, J. Appl. Phys. 1108 (2010) 5.
A.JR van den Boogaard, E. Louis, E. Zoethout, S. Mullender, F. BijkerkSurface morphology of Kr+-polished amorphous Si layers, J. Vac. Sci. Technol. A 428 (2010) 552-558.