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V de Rooij-Lohmann, I.V Kozhevnikov, L. Peverini, E. Ziegler, R. Cuerno, F. Bijkerk, A.E YakshinRoughness evolution of Si surfaces upon Ar ion erosion, Appl. Surf. Sci. 16256 (2010) 5011-5014.
A.E Yakshin, I.V Kozhevnikov, E. Zoethout, E. Louis, F. BijkerkProperties of broadband depth-graded multilayer mirrors for EUV optical systems, Opt. Express 718 (2010) 6957-6971.
S. Dobrovolskiy, A.E Yakshin, F.D Tichelaar, J. Verhoeven, E. Louis, F. BijkerkFormation of Si/SiC multilayers by low-energy ion implantation and thermal annealing, Nucl. Instrum. Methods Phys. Res. Sect. B-Beam Interact. Mater. Atoms 6268 (2010) 560-567.
J.Q Chen, E. Louis, J. Verhoeven, R. Harmsen, C.J Lee, M. Lubomska, M. van Kampen, W. van Schaik, F. BijkerkSecondary electron yield measurements of carbon covered multilayer optics, Appl. Surf. Sci. 2257 (2010) 354-361.
V de Rooij-Lohmann, L.W Veldhuizen, E. Zoethout, A.E Yakshin, R.WE van de Kruijs, B.J Thijsse, M. Gorgoi, F. Schafers, F. BijkerkChemical interaction of B4C, B, and C with Mo/Si layered structures, J. Appl. Phys. 9108 (2010) 6.
T. Tsarfati, R.WE van de Kruijs, E. Zoethout, E. Louis, F. BijkerkNitridation and contrast of B4C/La interfaces and X-ray multilayer optics, Thin Solid Films 24518 (2010) 7249-7252.
F. Gou, M.A Gleeson, A.W Kleyn, R.WE van de Kruijs, A.E Yakshin, F. BijkerkGrowth of silicon nitride films by bombarding amorphous silicon with N+ ions: MD simulation,  (2009) 3245-3248.
J.Q Chen, C.J Lee, E. Louis, F. Bijkerk, R. Kunze, H. Schmidt, D. Schneider, R. MoorsCharacterization of EUV induced carbon films using laser-generated surface acoustic waves,  (2009) 768-771.
T. Tsarfati, E. Zoethout, R. van de Kruijs, F. BijkerkGrowth and sacrificial oxidation of transition metal nanolayers, Surf. Sci. 7603 (2009) 1041-1045.
R.A Loch, A. Levy, T. Ceccotti, F. Quere, C. Thaury, H. George, F. Bijkerk, K.J Boller, P. MartinEnhanced ion acceleration with extremely thin foils, Eur. Phys. J.-Spec. Top. 175 (2009) 133-138.
T. Tsarfati, E. Zoethout, R.WE van de Kruijs, F. BijkerkAtomic O and H exposure of C-covered and oxidized d-metal surfaces, Surf. Sci. 16603 (2009) 2594-2599.
T. Tsarfati, R de Kruijs, E. Zoethout, E. Louis, F. BijkerkReflective multilayer optics for 6.7 nm wavelength radiation sources and next generation lithography, Thin Solid Films 5518 (2009) 1365-1368.
V Rooij-Lohmann, A.W Kleyn, F. Bijkerk, H.H Brongersma, A.E YakshinDiffusion and interaction studied nondestructively and in real-time with depth-resolved low energy ion spectroscopy, Appl. Phys. Lett. 694 (2009) 3.
I. Nedelcu, R.WE van de Kruijs, A.E Yakshin, F. BijkerkMicrostructure of Mo/Si multilayers with B4C diffusion barrier layers, Appl. Optics 248 (2009) 155-160.
T. Tsarfati, E. Zoethout, R. van de Kruijs, F. BijkerkIn-depth agglomeration of d-metals at Si-on-Mo interfaces, J. Appl. Phys. 6105 (2009) 5.
T. Tsarfati, E. Zoethout, R. van de Kruijs, F. BijkerkChemically mediated diffusion of d-metals and B through Si and agglomeration at Si-on-Mo interfaces, J. Appl. Phys. 10105 (2009) 5.
S.M Wu, R. van de Kruijs, E. Zoethout, F. BijkerkSputtering yields of Ru, Mo, and Si under low energy Ar+ bombardment, J. Appl. Phys. 5106 (2009) 6.
J.Q Chen, E. Louis, C.J Lee, H. Wormeester, R. Kunze, H. Schmidt, D. Schneider, R. Moors, W. van Schaik, M. Lubomska et al.Detection and characterization of carbon contamination on EUV multilayer mirrors, Opt. Express 1917 (2009) 16969-16979.