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Journal Article
H.J Voorma, E. Louis, F. Bijkerk, S. AbdaliAngular and energy dependence of ion bombardment of Mo/Si multilayers, Journal of Applied Physics 482 (1997) 1876-1881.
H.J Voorma, E. Louis, N.B Koster, F. Bijkerk, E. SpillerCharacterization of multilayers by Fourier analysis of x-ray reflectivity, Journal of Applied Physics 981 (1997) 6112-6119.
H.J Voorma, F. BijkerkDesign of an Extended Image Field Soft-X-Ray Projection System, Microelectronic Engineering 1-417 (1992) 145-148.
E. Louis, H.J Voorma, N.B Koster, L. Shmaenok, F. Bijkerk, R. Schlatmann, J. Verhoeven, Y.Y Platonov, G.E van Dorssen, H.A PadmoreEnhancement of Reflectivity of Multilayer Mirrors for Soft-X-Ray Projection Lithography by Temperature Optimization and Ion-Bombardment, Microelectronic Engineering 1-423 (1994) 215-218.
H.J Voorma, G.E van Dorssen, E. Louis, N.B Koster, A.D Smith, M.D Roper, F. BijkerkEXAFS measurements on the structure of Mo/Si multilayers produced using ion bombardment and increased deposition temperature, Applied Surface Science 393 (1996) 221-230.
F. Bijkerk, L.A Shmaenok, E. Louis, H.J Voorma, N.B Koster, C. Bruineman, R Bastiaensen, E.WJM van der Drift, J. Romijn, L.EM de Groot et al.Extreme UV lithography: A new laser plasma target concept and fabrication of multilayer reflection masks, Microelectronic Engineering 1-430 (1996) 183-186.
H.J Voorma, E. Louis, N.B Koster, F. Bijkerk, T. Zijlstra, L.EM de Groot, B.AC Rousseeuw, J. Romijn, E.WJM van der Drift, J. FriedrichFabrication and analysis of extreme ultraviolet reflection masks with patterned W/C absorber bilayers, Journal of Vacuum Science & Technology B 215 (1997) 293-298.
E. Louis, H.J Voorma, N.B Koster, F. Bijkerk, Y.Y Platonov, S.Y Zuev, S.S Andreev, E.A Shamov, N.N SalashchenkoMultilayer Coated Reflective Optics for Extreme Uv Lithography, Microelectronic Engineering 1-427 (1995) 235-238.
E. Louis, F. Bijkerk, L. Shmaenok, H.J Voorma, M.J van der Wiel, R. Schlatmann, J. Verhoeven, E.WJM van der Drift, J. Romijn, B.AC Rousseeuw et al.Soft-X-Ray Projection Lithography Using a High-Repetition-Rate Laser-Induced X-Ray Source for Sub-100 Nanometer Lithography Processes, Microelectronic Engineering 1-421 (1993) 67-70.
H.J Voorma, E. Louis, N.B Koster, F. BijkerkTemperature induced diffusion in Mo/Si multilayer mirrors, Journal of Applied Physics 983 (1998) 4700-4708.