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R.C Wieggers, W.J Goedheer, M.R. Akdim, F. Bijkerk, P.A ZegelingA particle-in-cell plus Monte Carlo study of plasma-induced damage of normal incidence collector optics used in extreme ultraviolet lithography, J. Appl. Phys. 1103 (2008) 7.
R. Stuik, E. Louis, A.E Yakshin, P.C Gorts, E.LG Maas, F. Bijkerk, D. Schmitz, F. Scholze, G. Ulm, M. HaidlPeak and Integrated reflectivity, wavelength and gamma optimization of Mo/Si, and Mo/Be multilayer, multielement optics for extreme ultraviolet lithography, Journal of Vacuum Science & Technology B 617 (1999) 2998-3002.
R.A Loch, A. Dubrouil, R. Sobierajski, D. Descamps, B. Fabre, P. Lidon, R.WE van de Kruijs, F. Boekhout, E. Gullikson, J. Gaudin et al.Phase characterization of the reflection on an extreme UV multilayer: comparison between attosecond metrology and standing wave measurements, Opt. Lett. 36 (2011) 3386-3388.
D.I Astakhov, W.J Goedheer, C.J Lee, V.V Ivanov, V.M Krivtsun, A.I Zotovich, S.M Zyryanov, D.V Lopaev, F. BijkerkPlasma probe characteristics in low density hydrogen pulsed plasmas, Plasma Sources Sci. Technol. 24 (2015) 055018.
G. Kooijman, et al, R. de Bruijn, K. Koshelev, F. BijkerkPrepulse enhanced EUV yield from a xenon gas-jet laser produced plasma, Central Laser Facility, Rutherford Appleton Laboratory, Annual Report 2001-2002  (2002) 
A.E Yakshin, I.V Kozhevnikov, E. Zoethout, E. Louis, F. BijkerkProperties of broadband depth-graded multilayer mirrors for EUV optical systems, Opt. Express 718 (2010) 6957-6971.