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E. Louis, H.J Voorma, N.B Koster, F. Bijkerk, Y.Y Platonov, S.Y Zuev, S.S Andreev, E.A Shamov, N.N SalashchenkoMultilayer Coated Reflective Optics for Extreme Uv Lithography, Microelectronic Engineering 1-427 (1995) 235-238.
V.V Medvedev, R.WE van de Kruijs, A.E Yakshin, N.N Novikova, V.M Krivtsun, E. Louis, A.M Yakunin, F. BijkerkMultilayer mirror with enhanced spectral selectivity for the next generation extreme ultraviolet lithography, Appl. Phys. Lett. 22103 (2013) 221114.
E. Louis, A.E Yakshin, T. Tsarfati, F. BijkerkNanometer interface and materials control for multilayer EUV-optical applications, Prog. Surf. Sci. 86 (2011) 255-294.
R.WE van de Kruijs, E. Zoethout, A.E Yakshin, I. Nedelcu, E. Louis, H. Enkisch, G. Sipos, S. Mullender, F. BijkerkNano-size crystallites in Mo/Si multilayer optics, Thin Solid Films 2515 (2006) 430-433.
T. Tsarfati, R.WE van de Kruijs, E. Zoethout, E. Louis, F. BijkerkNitridation and contrast of B4C/La interfaces and X-ray multilayer optics, Thin Solid Films 24518 (2010) 7249-7252.
J. Bosgra, J. Verhoeven, R.WE van de Kruijs, A.E Yakshin, F. BijkerkNon-constant diffusion characteristics of nanoscopic Mo-Si interlayer growth, Thin Solid Films 522 (2012) 228–232.
V.V Ivanov, P.S Antsiferov, K.N Koshelev, M.R. Akdim, F. BijkerkNumerical simulation of the creation of a hollow neutral-hydrogen channel by an electron beam, Physical Review Letters 2097 (2006) 
G.E van Dorssen, E. Louis, F. BijkerkOptimization of X-Ray-Emission from a Laser-Produced Plasma in a Narrow Wavelength Band, Laser and Particle Beams 410 (1992) 759-765.
R.C Wieggers, W.J Goedheer, M.R. Akdim, F. Bijkerk, P.A ZegelingA particle-in-cell plus Monte Carlo study of plasma-induced damage of normal incidence collector optics used in extreme ultraviolet lithography, J. Appl. Phys. 1103 (2008) 7.
R. Stuik, E. Louis, A.E Yakshin, P.C Gorts, E.LG Maas, F. Bijkerk, D. Schmitz, F. Scholze, G. Ulm, M. HaidlPeak and Integrated reflectivity, wavelength and gamma optimization of Mo/Si, and Mo/Be multilayer, multielement optics for extreme ultraviolet lithography, Journal of Vacuum Science & Technology B 617 (1999) 2998-3002.
R.A Loch, A. Dubrouil, R. Sobierajski, D. Descamps, B. Fabre, P. Lidon, R.WE van de Kruijs, F. Boekhout, E. Gullikson, J. Gaudin et al.Phase characterization of the reflection on an extreme UV multilayer: comparison between attosecond metrology and standing wave measurements, Opt. Lett. 36 (2011) 3386-3388.
D.I Astakhov, W.J Goedheer, C.J Lee, V.V Ivanov, V.M Krivtsun, A.I Zotovich, S.M Zyryanov, D.V Lopaev, F. BijkerkPlasma probe characteristics in low density hydrogen pulsed plasmas, Plasma Sources Sci. Technol. 24 (2015) 055018.
A.E Yakshin, I.V Kozhevnikov, E. Zoethout, E. Louis, F. BijkerkProperties of broadband depth-graded multilayer mirrors for EUV optical systems, Opt. Express 718 (2010) 6957-6971.
J.M Sturm, C.J Lee, F. BijkerkReactions of ethanol on Ru(0001), Surf. Sci. 612 (2013) 42-47.
E. Zoethout, E. Louis, F. BijkerkReal-space insight in the nanometer scale roughness development during growth and ion beam polishing of molybdenum silicon multilayer films, Appl. Surf. Sci. 285, Part B (2013) 293-299.
V de Rooij-Lohmann, A.E Yakshin, E. Zoethout, J. Verhoeven, F. BijkerkReduction of interlayer thickness by low-temperature deposition of Mo/Si multilayer mirrors for X-ray reflection, Appl. Surf. Sci. 257 (2011) 6251-6255.
T. Tsarfati, R de Kruijs, E. Zoethout, E. Louis, F. BijkerkReflective multilayer optics for 6.7 nm wavelength radiation sources and next generation lithography, Thin Solid Films 5518 (2009) 1365-1368.
I. Nedelcu, R.W.E. van de Kruijs, A.E Yakshin, G. von Blanckenhagen, F. BijkerkReflectivity and surface roughness of multilayer-coated substrate recovery layers for EUV lithographic optics, Opt. Eng. 647 (2008) 5.
V de Rooij-Lohmann, I.V Kozhevnikov, L. Peverini, E. Ziegler, R. Cuerno, F. Bijkerk, A.E YakshinRoughness evolution of Si surfaces upon Ar ion erosion, Appl. Surf. Sci. 16256 (2010) 5011-5014.
J.Q Chen, E. Louis, J. Verhoeven, R. Harmsen, C.J Lee, M. Lubomska, M. van Kampen, W. van Schaik, F. BijkerkSecondary electron yield measurements of carbon covered multilayer optics, Appl. Surf. Sci. 2257 (2010) 354-361.