Publications
Multilayer Coated Reflective Optics for Extreme Uv Lithography, Microelectronic Engineering 1-427 (1995) 235-238.
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Multilayer mirror with enhanced spectral selectivity for the next generation extreme ultraviolet lithography, Appl. Phys. Lett. 22103 (2013) 221114.
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Nanometer interface and materials control for multilayer EUV-optical applications, Prog. Surf. Sci. 86 (2011) 255-294.
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Nitridation and contrast of B4C/La interfaces and X-ray multilayer optics, Thin Solid Films 24518 (2010) 7249-7252.
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Non-constant diffusion characteristics of nanoscopic Mo-Si interlayer growth, Thin Solid Films 522 (2012) 228–232.
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Numerical simulation of the creation of a hollow neutral-hydrogen channel by an electron beam, Physical Review Letters 2097 (2006)
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Optimization of X-Ray-Emission from a Laser-Produced Plasma in a Narrow Wavelength Band, Laser and Particle Beams 410 (1992) 759-765.
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A particle-in-cell plus Monte Carlo study of plasma-induced damage of normal incidence collector optics used in extreme ultraviolet lithography, J. Appl. Phys. 1103 (2008) 7.
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Peak and Integrated reflectivity, wavelength and gamma optimization of Mo/Si, and Mo/Be multilayer, multielement optics for extreme ultraviolet lithography, Journal of Vacuum Science & Technology B 617 (1999) 2998-3002.
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Phase characterization of the reflection on an extreme UV multilayer: comparison between attosecond metrology and standing wave measurements, Opt. Lett. 36 (2011) 3386-3388.
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Plasma probe characteristics in low density hydrogen pulsed plasmas, Plasma Sources Sci. Technol. 24 (2015) 055018.
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Properties of broadband depth-graded multilayer mirrors for EUV optical systems, Opt. Express 718 (2010) 6957-6971.
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Real-space insight in the nanometer scale roughness development during growth and ion beam polishing of molybdenum silicon multilayer films, Appl. Surf. Sci. 285, Part B (2013) 293-299.
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Reduction of interlayer thickness by low-temperature deposition of Mo/Si multilayer mirrors for X-ray reflection, Appl. Surf. Sci. 257 (2011) 6251-6255.
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Reflective multilayer optics for 6.7 nm wavelength radiation sources and next generation lithography, Thin Solid Films 5518 (2009) 1365-1368.
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Reflectivity and surface roughness of multilayer-coated substrate recovery layers for EUV lithographic optics, Opt. Eng. 647 (2008) 5.
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Secondary electron yield measurements of carbon covered multilayer optics, Appl. Surf. Sci. 2257 (2010) 354-361.
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