Publications

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2012
S.L Nyabero, R.WE van de Kruijs, A.E Yakshin, E. Zoethout, F. BijkerkThermally induced interface chemistry in Mo/B4C/Si/B4C multilayered films, J. Appl. Phys. 112 (2012) 054317.
I.A Makhotkin, E. Zoethout, E. Louis, A.M Yakunin, S. Mullender, F. BijkerkSpectral properties of La/B - based multilayer mirrors near the boron K absorption edge, Opt. Express 20 (2012) 11778-11786.
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S. Bruijn, R.WE van de Kruijs, A.E Yakshin, F. BijkerkIon assisted growth of B4C diffusion barrier layers in Mo/Si multilayered structures, J. Appl. Phys. 111 (2012) 064303.
F. Liu, C.J Lee, J.Q Chen, E. Louis, P.JM van der Slot, K.J Boller, F. BijkerkEllipsometry with randomly varying polarization states, Opt. Express 20 (2012) 870-878.
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A.JR van den Boogaard, F.A van Goor, E. Louis, F. BijkerkWavelength separation from extreme ultraviolet mirrors using phaseshift reflection, Opt. Lett. 237 (2012) 160-162.
A.S Kuznetsov, M.A Gleeson, F. BijkerkHydrogen-induced blistering mechanisms in thin film coatings, J. Phys. Condens. Matter 24 (2012) 052203.
OA PDF icon 2012_49078.pdf (1.41 MB)
R.A Loch, R. Sobierajski, E. Louis, J. Bosgra, F. BijkerkModelling single shot damage thresholds of multilayer optics for high-intensity short-wavelength radiation sources, Opt. Express 2720 (2012) 28200–28215.
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A.S Kuznetsov, R. Stuik, F. Bijkerk, A.P ShevelkoSpectral and spatial structure of extreme ultraviolet radiation in laser plasma-wall interactions, Plasma Phys. Control. Fusion 54 (2012) 085019.
V.V Medvedev, A.E Yakshin, R.WE van de Kruijs, V.M Krivtsun, A.M Yakunin, K.N Koshelev, F. BijkerkInfrared antireflective filtering for extreme ultraviolet multilayer Bragg reflectors, Opt. Lett. 37 (2012) 1169-1171.
J. Bosgra, E. Zoethout, A.MJ van der Eerden, J. Verhoeven, R.WE van de Kruijs, A.E Yakshin, F. BijkerkStructural properties of subnanometer thick Y layers in extreme ultraviolet multilayer mirrors, Appl. Opt. 3651 (2012) 8541-8548.
I. Makhotkin, E. Zoethout, E. Louis, A.M Yakunin, S. Muellender, F. BijkerkWavelength selection for multilayer coatings for lithography generation beyond extreme ultraviolet, J. Micro-Nanolithogr. MEMS MOEMS 411 (2012) 040501.
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A.JR van den Boogaard, E. Zoethout, I.A Makhotkin, E. Louis, F. BijkerkInfluence of noble gas ion polishing species on extreme ultraviolet mirrors, J. Appl. Phys. 12112 (2012) 123502.
M. Bayraktar, W. Wessels, C.J Lee, F. Van Goor, G. Koster, G. Rijnders, F. BijkerkActive multilayer mirrors for reflectance tuning at extreme ultraviolet (EUV) wavelengths, J. Phys. D: Appl. Phys. 4945 (2012) 494001.
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J. Bosgra, J. Verhoeven, R.WE van de Kruijs, A.E Yakshin, F. BijkerkNon-constant diffusion characteristics of nanoscopic Mo-Si interlayer growth, Thin Solid Films 522 (2012) 228–232.

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