Publications

Export 8 results:
Author Title [ Type(Desc)] Year
Filters: Author is Shmaenok, L.  [Clear All Filters]
Journal Article
E. Louis, H.J Voorma, N.B Koster, L. Shmaenok, F. Bijkerk, R. Schlatmann, J. Verhoeven, Y.Y Platonov, G.E van Dorssen, H.A PadmoreEnhancement of Reflectivity of Multilayer Mirrors for Soft-X-Ray Projection Lithography by Temperature Optimization and Ion-Bombardment, Microelectronic Engineering 1-423 (1994) 215-218.
F. Bijkerk, L. Shmaenok, A. Vanhonk, R. Bastiaensen, Y.Y Platonov, A.P Shevelko, A.V Mitrofanov, F. Voss, R. Desor, H. Frowein et al.Laser-Plasma Sources for Soft-X-Ray Projection Lithography, Journal De Physique Iii 94 (1994) 1669-1677.
M. De Bock, K. Jakubowska, M. von Hellermann, R. Jaspers, A.JH Donne, L. ShmaenokMeasuring one-dimensional and two-dimensional impurity density profiles on TEXTOR using combined charge exchange-beam emission spectroscopy and ultrasoft x-ray tomography, Review of Scientific Instruments 1075 (2004) 4155-4157.
K. Jakubowska, M. De Bock, R. Jaspers, M. von Hellermann, L. ShmaenokMotional Stark effect diagnostic on TEXTOR, Review of Scientific Instruments 1075 (2004) 3475-3477.
A.JH Donne, R. Jaspers, C.J Barth, H. Bindslev, B.SQ Elzendoorn, J.C van Gorkom, H.J van der Meiden, T. Oyevaar, M.J. van de Pol, V.S. Udintsev et al.New diagnostics for physics studies on TEXTOR-94 (invited), Review of Scientific Instruments 172 (2001) 1046-1053.
A.JH Donne, M.FM de Bock, I.G.J. Classen, M.G von Hellermann, K. Jakubowska, R. Jaspers, C.J Barth, H.J van der Meiden, T. Oyevaar, M.J. van de Pol et al.Overview of core diagnostics for TEXTOR, Fusion Sci. Technol. 247 (2005) 220-245.
M. von Hellermann, M. De Bock, R. Jaspers, K. Jakubowska, R. Barnsley, C. Giroud, N.C Hawkes, K.D Zastrow, P. Lotte, R. Giannella et al.Pilot experiments for the International Thermonuclear Experimental Reactor active beam spectroscopy diagnostic, Review of Scientific Instruments 1075 (2004) 3458-3461.
E. Louis, F. Bijkerk, L. Shmaenok, H.J Voorma, M.J van der Wiel, R. Schlatmann, J. Verhoeven, E.WJM van der Drift, J. Romijn, B.AC Rousseeuw et al.Soft-X-Ray Projection Lithography Using a High-Repetition-Rate Laser-Induced X-Ray Source for Sub-100 Nanometer Lithography Processes, Microelectronic Engineering 1-421 (1993) 67-70.