Publications
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Filters: Author is Rousseeuw, B. A. C. [Clear All Filters]
Extreme UV lithography: A new laser plasma target concept and fabrication of multilayer reflection masks, Microelectronic Engineering 1-430 (1996) 183-186.
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Fabrication and analysis of extreme ultraviolet reflection masks with patterned W/C absorber bilayers, Journal of Vacuum Science & Technology B 215 (1997) 293-298.
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Soft-X-Ray Projection Lithography Using a High-Repetition-Rate Laser-Induced X-Ray Source for Sub-100 Nanometer Lithography Processes, Microelectronic Engineering 1-421 (1993) 67-70.
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