Publications

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Journal Article
V.V Medvedev, R.WE van de Kruijs, A.E Yakshin, N.N Novikova, V.M Krivtsun, E. Louis, A.M Yakunin, F. BijkerkMultilayer mirror with enhanced spectral selectivity for the next generation extreme ultraviolet lithography, Appl. Phys. Lett. 22103 (2013) 221114.
E. Louis, A.E Yakshin, T. Tsarfati, F. BijkerkNanometer interface and materials control for multilayer EUV-optical applications, Prog. Surf. Sci. 86 (2011) 255-294.
R.WE van de Kruijs, E. Zoethout, A.E Yakshin, I. Nedelcu, E. Louis, H. Enkisch, G. Sipos, S. Mullender, F. BijkerkNano-size crystallites in Mo/Si multilayer optics, Thin Solid Films 2515 (2006) 430-433.
J. Bosgra, J. Verhoeven, R.WE van de Kruijs, A.E Yakshin, F. BijkerkNon-constant diffusion characteristics of nanoscopic Mo-Si interlayer growth, Thin Solid Films 522 (2012) 228–232.
R. Stuik, E. Louis, A.E Yakshin, P.C Gorts, E.LG Maas, F. Bijkerk, D. Schmitz, F. Scholze, G. Ulm, M. HaidlPeak and Integrated reflectivity, wavelength and gamma optimization of Mo/Si, and Mo/Be multilayer, multielement optics for extreme ultraviolet lithography, Journal of Vacuum Science & Technology B 617 (1999) 2998-3002.
A.E Yakshin, I.V Kozhevnikov, E. Zoethout, E. Louis, F. BijkerkProperties of broadband depth-graded multilayer mirrors for EUV optical systems, Opt. Express 718 (2010) 6957-6971.
V de Rooij-Lohmann, A.E Yakshin, E. Zoethout, J. Verhoeven, F. BijkerkReduction of interlayer thickness by low-temperature deposition of Mo/Si multilayer mirrors for X-ray reflection, Appl. Surf. Sci. 257 (2011) 6251-6255.
I. Nedelcu, R.W.E. van de Kruijs, A.E Yakshin, G. von Blanckenhagen, F. BijkerkReflectivity and surface roughness of multilayer-coated substrate recovery layers for EUV lithographic optics, Opt. Eng. 647 (2008) 5.
V de Rooij-Lohmann, I.V Kozhevnikov, L. Peverini, E. Ziegler, R. Cuerno, F. Bijkerk, A.E YakshinRoughness evolution of Si surfaces upon Ar ion erosion, Appl. Surf. Sci. 16256 (2010) 5011-5014.
M van Herpen, R de Kruijs, D.JW Klunder, E. Louis, A.E Yakshin, A S. van der Westen, F. Bijkerk, V. BanineSpectral-purity-enhancing layer for multilayer mirrors, Opt. Lett. 633 (2008) 560-562.
J. Bosgra, E. Zoethout, A.MJ van der Eerden, J. Verhoeven, R.WE van de Kruijs, A.E Yakshin, F. BijkerkStructural properties of subnanometer thick Y layers in extreme ultraviolet multilayer mirrors, Appl. Opt. 3651 (2012) 8541-8548.
S.P Huber, R.WE van de Kruijs, A.E Yakshin, E. Zoethout, K.-J. Boller, F. BijkerkSubwavelength single layer absorption resonance antireflection coatings, Opt. Express 122 (2014) 490–497.
OA 
I. Nedelcu, R.WE van de Kruijs, A.E Yakshin, F. BijkerkTemperature-dependent nanocrystal formation in Mo/Si multilayers, Physical Review B 2476 (2007) 
I. Nedelcu, R de Kruijs, A.E Yakshin, F. BijkerkThermally enhanced interdiffusion in Mo/Si multilayers, J. Appl. Phys. 8103 (2008) 6.
S. Bruijn, R.WE van de Kruijs, A.E Yakshin, E. Zoethout, F. BijkerkThermally induced decomposition of B4C barrier layers in Mo/Si multilayer structures, Surf. Coat. Technol. 7205 (2010) 2469-2473.
S.L Nyabero, R.WE van de Kruijs, A.E Yakshin, E. Zoethout, F. BijkerkThermally induced interface chemistry in Mo/B4C/Si/B4C multilayered films, J. Appl. Phys. 112 (2012) 054317.

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