Publications

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2016
T.PC Klaver, K. Nordlund, T.W Morgan, E. Westerhof, B.J Thijsse, M.CM van de SandenMolecular dynamics simulations of ballistic He penetration into W fuzz, Nucl. Fusion 56 (2016) 126015.
OA PDF icon 2016_65370.pdf (8.87 MB)
X. Zhang, P. Klaver, R. van Santen, M.CM van de Sanden, A. BieberleOxygen Evolution at Hematite Surfaces: The Impact of Structure and Oxygen Vacancies on Lowering the Overpotential, J. Phys. Chem. C 120 (2016) 18201-18208.
OA PDF icon 2016_65273.pdf (811.35 KB)
I. Dogan, R. Gresback, T. Nozaki, M.CM van de SandenAnalysis of temporal evolution of quantum dot surface chemistry by surface-enhanced Raman scattering, Sci. Rep. 6 (2016) 29508.
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S.A Starostin, W. Keuning, J. Schalken, M. Creatore, W.MM Kessels, J.B Bouwstra, M.CM van de Sanden, H.W de VriesSynergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers, Plasma Processes Polym. 13 (2016) 311-315.
OA PDF icon 2016_64579.pdf (426.5 KB)
N. Leick, J.W Weber, A.JM Mackus, M.J Weber, M.CM van de Sanden, W.MM KesselsIn situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd, J. Phys. D: Appl. Phys. 49 (2016) 115504.
I. Dogan, M.CM van de SandenGas-Phase Plasma Synthesis of Free-Standing Silicon Nanoparticles for Future Energy Applications, Plasma Processes Polym. 13 (2016) 19-53.
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N. Leick, J.W Weber, A.JM Mackus, M.J Weber, M.CM van de Sanden, W.MM KesselsErratum: In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd (2016 J. Phys. D: Appl. Phys . 49 115504), J. Phys. D: Appl. Phys. 49 (2016) 269601.
F.JJ Peeters, R.F Rumphorst, M.CM van de SandenDielectric barrier discharges revisited: the case for mobile surface charge, Plasma Sources Sci. Technol. 25 (2016) 03LT03.
OA PDF icon 2016_64770.pdf (395.79 KB)
A. Bogaerts, M.CM van de SandenSpecial Issue of Papers by Plenary and Topical Invited Lecturers at the 22nd International Symposium on Plasma Chemistry (ISPC 22), 5-10 July 2015, Antwerp, Belgium: Introduction, Plasma Chem. Plasma P. 36 (2016) 1-2.
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S. Ponduri, M.M Becker, S. Welzel, M.CM van de Sanden, D. Loffhagen, R. EngelnFluid modelling of CO2 dissociation in a dielectric barrier discharge, J. Appl. Phys. 119 (2016) 093301.
OA PDF icon 2016_64509.pdf (5.17 MB)
B.L Williams, M.V Ponomarev, M.A Verheijen, H.CM Knoops, A. Chandramohan, L. Duval, M.CM van de Sanden, M. CreatoreExpanding Thermal Plasma Deposition of Al-Doped ZnO: On the Effect of the Plasma Chemistry on Film Growth Mechanisms, Plasma Processes Polym. 13 (2016) 54-69.
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N. den Harder, S. Brezinsek, T. Putterich, N. Fedorczak, G.F Matthews, A. Meigs, M.F Stamp, M.CM van de Sanden, G.J van Rooij, JET ContributorsELM-resolved divertor erosion in the JET ITER-Like Wall, Nucl. Fusion 56 (2016) 026014.
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G.G van Eden, T.W Morgan, D.UB Aussems, M.A van den Berg, K. Bystrov, M.CM van de SandenSelf-Regulated Plasma Heat Flux Mitigation Due to Liquid Sn Vapor Shielding, Phys. Rev. Lett. 116 (2016) 135002.
OA PDF icon 2016_64580.pdf (772.08 KB)

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