Publications

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S.A Lynch, G. Matmon, S.G Pavlov, K.L Litvinenko, B. Redlich, A.FG van der Meer, N.V Abrosimov, H.W HubersInhomogeneous broadening of phosphorus donor lines in the far-infrared spectra of single-crystalline SiGe, Phys. Rev. B 2482 (2010) 7.
J.L Lyman, B.E Newnam, J.W Early, A.FG van der MeerInfrared free-electron-laser photolysis of CFCl3 and CF2Cl2, Journal of Physical Chemistry A 1101 (1997) 49-54.
T. Lunt, G.P. Canal, B.P Duval, Y. Feng, B. Labit, P. McCarthy, H. Reimerdes, W.AJ Vijvers, M. WischmeierNumerical study of potential heat flux mitigation effects in the TCV snowflake divertor, Plasma Phys. Control. Fusion 58 (2016) 045027.
OA 
T.C Luce, C.D Challis, S. Ide, E. Joffrin, Y. Kamada, P.A Polizer, J. Schweinzer, A.C.C. Sips, J. Stober, G. Giruzzi et al.Development of advanced inductive scenarios for ITER, Nucl. Fusion 54 (2014) 013015.
OA PDF icon 2014_55786.pdf (3.82 MB)
X.D Lu, Y. Qin, J. Ning, T. Zhou, C.Y Deng, C. Meng, Q. Qian, F. Gou, Z. Chuanwu, Y. Ying et al.Film growth by polyatomic C2H5+ bombarding a diamond (100) surfaces: Molecular dynamics study,  (2009) 3238-3241.
X. Lu, J. Ning, Y. Qin, Q. Qian, Z. Chuanwu, Y. Ying, J. Ming, F. GouSubstrate temperature effect on F+ etching of SiC: Molecular dynamics simulation,  (2009) 3235-3237.
X. Lu, X. Gao, X. Guo, P. La, Q. Dong, X. ZhangMolecular Dynamics Study of Superelastic Performance of a β-Si3N4 Nanohelical Coil, J. Phys. Chem. Lett. 7 (2016) 3766-3769.
X. Lu, Y. Qin, J. Ning, T. Zhou, C.Y Deng, C. Meng, Q. Qian, Z. Chuanwu, Y. Ying, J. Ming et al.Molecular dynamics simulations of CH+ ions interaction with silicon carbide,  (2009) 3242-3244.
G. Lozano, S.RK Rodriguez, M.A Verschuuren, J Gomez RivasMetallic nanostructures for efficient LED lighting, Light Sci. Appl. 5 (2016) e16080.
OA 
E. Louis, F. Bijkerk, L. Shmaenok, H.J Voorma, M.J van der Wiel, R. Schlatmann, J. Verhoeven, E.WJM van der Drift, J. Romijn, B.AC Rousseeuw et al.Soft-X-Ray Projection Lithography Using a High-Repetition-Rate Laser-Induced X-Ray Source for Sub-100 Nanometer Lithography Processes, Microelectronic Engineering 1-421 (1993) 67-70.
E. Louis, A.E Yakshin, T. Tsarfati, F. BijkerkNanometer interface and materials control for multilayer EUV-optical applications, Prog. Surf. Sci. 11-1286 (2011) 255-294.
E. LouisPhysics and technology development of multilayer EUV reflective optics, PhD (2012) 
E. Louis, H.J Voorma, N.B Koster, F. Bijkerk, Y.Y Platonov, S.Y Zuev, S.S Andreev, E.A Shamov, N.N SalashchenkoMultilayer Coated Reflective Optics for Extreme Uv Lithography, Microelectronic Engineering 1-427 (1995) 235-238.
E. Louis, H.J Voorma, N.B Koster, L. Shmaenok, F. Bijkerk, R. Schlatmann, J. Verhoeven, Y.Y Platonov, G.E van Dorssen, H.A PadmoreEnhancement of Reflectivity of Multilayer Mirrors for Soft-X-Ray Projection Lithography by Temperature Optimization and Ion-Bombardment, Microelectronic Engineering 1-423 (1994) 215-218.
D. Lopez-Gonzalez, M.N Tsampas, A. Boréave, L. Retailleau-Mevel, M. Klotz, C. Tardivat, B. Cartoixa, K. Pajot, P. VernouxMixed Ionic–Electronic Conducting Catalysts for Catalysed Gasoline Particulate Filters, Top. Catal. 58 (2015) 1242-1255.
N.J. Lopes CardozoAnomalous transport due to magnetic turbulence, Fusion Science and Technology 2T41 (2002) 276-284.
N.J. Lopes CardozoAnomalous transport due to magnetic turbulence, Fusion Science and Technology 2T45 (2004) 321-329.
N.J. Lopes CardozoAnomalous transport due to magnetic turbulence, Fusion Science and Technology 2T49 (2006) 300-308.
N.J. Lopes Cardozo, A. Bradshaw, P. VandenplasReexamining fusion power, Science 5784313 (2006) 170-171.
N.J. Lopes Cardozo, I.G.J. Classen, C.J Barth, C.C. Chu, A.JH Donne, R. Jaspers, J. Lok, A.AM Oomens, F.J. Pijper, F.C SchüllerPlasma filamentation in the Rijnhuizen Tokamak RTP (vol 73, pg 256, 1994), Physical Review Letters 1490 (2003) 

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