F. Scholze

Koster, N., Mertens, B., Jansen, R., van de Runstraat, A., Stietz, F., Wedowski, M., … Yakshin, A. (2002). Molecular contamination mitigation in EUVL by environmental control. Microelectronic Engineering, 61-2, 65-76. Retrieved from <Go to ISI>://000176594700009 (Original work published 2002)

Stuik, R., Scholze, F., Tummler, J., & Bijkerk, F. (2002). Absolute calibration of a multilayer-based XUV diagnostic. Nuclear Instruments & Methods in Physics Research Section A-Accelerators Spectrometers Detectors and Associated Equipment, 492, 305-316. Retrieved from <Go to ISI>://000178825300028 (Original work published 2002)

Stuik, R., Louis, E., Yakshin, A. E., Gorts, P. C., Maas, E. L. G., Bijkerk, F., … Haidl, M. (1999). Peak and Integrated reflectivity, wavelength and gamma optimization of Mo/Si, and Mo/Be multilayer, multielement optics for extreme ultraviolet lithography. Journal of Vacuum Science & Technology B, 17, 2998-3002. https://doi.org/10.1116/1.590942 (Original work published 1999)