K. B. Jinesh

Jinesh, K. B., van Hemmen, J. L., van de Sanden, M. C. M., Roozeboom, F. ., Klootwijk, J. H., Besling, W. F. A., & Kessels, W. M. M. (2011). Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films. Journal of the Electrochemical Society, 158(2), G21-G26. https://doi.org/10.1149/1.3517430