E. Langereis

Knoops, H. C. M., Langereis, E., van de Sanden, M. C. M., & Kessels, W. M. M. (2012). Reaction mechanisms of atomic layer deposition of TaN(x) from Ta(NMe(2))(5) precursor and H(2)-based plasmas. Journal of Vacuum Science & Technology A, 30(1), 01A101. https://doi.org/10.1116/1.3625565 (Original work published 2012)

Leick, N., Verkuijlen, R. O. F., Lamagna, L., Langereis, E., Rushworth, S., Roozeboom, F., … Kessels, W. M. M. (2011). Atomic layer deposition of Ru from CpRu(CO)(2)Et using O-2 gas and O-2 plasma. Journal of Vacuum Science & Technology A, 29(2), 021016. https://doi.org/10.1116/1.3554691 (Original work published 2011)

Langereis, E., Roijmans, R., Roozeboom, F., van de Sanden, M. C. M., & Kessels, W. M. M. (2011). Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors. Journal of the Electrochemical Society, 158(2), G34-G38. https://doi.org/10.1149/1.3522768