H. C. M. Knoops

Williams, B. L., Ponomarev, M. V., Verheijen, M. A., Knoops, H. C. M., Chandramohan, A. ., Duval, L. ., … Creatore, M. . (2016). Expanding Thermal Plasma Deposition of Al-Doped ZnO: On the Effect of the Plasma Chemistry on Film Growth Mechanisms. Plasma Processes and Polymers, 13(1), 54-69. https://doi.org/10.1002/ppap.201500179

Knoops, H. C. M., Donders, M. E., van de Sanden, M. C. M., Notten, P. H. L., & Kessels, W. M. M. (2012). Atomic layer deposition for nanostructured Li-ion batteries. Journal of Vacuum Science & Technology A, 30(1), 010801. https://doi.org/10.1116/1.3660699 (Original work published 2025)

Knoops, H. C. M., Langereis, E. ., van de Sanden, M. C. M., & Kessels, W. M. M. (2012). Reaction mechanisms of atomic layer deposition of TaN(x) from Ta(NMe(2))(5) precursor and H(2)-based plasmas. Journal of Vacuum Science & Technology A, 30(1), 01A101. https://doi.org/10.1116/1.3625565 (Original work published 2025)

Saadaoui, M. ., van Zeijl, H. ., Wien, W. H. A., Pham, H. T. M., Kwakernaak, C. ., Knoops, H. C. M., … Sarro, P. M. (2011). Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined with LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating. Ieee Transactions on Components Packaging and Manufacturing Technology, 1(11), 1728-1738. https://doi.org/10.1109/TCPMT.2011.2167969 (Original work published 2025)

Donders, M. E., Knoops, H. C. M., van de Sanden, M. C. M., Kessels, W. M. M., & Notten, P. H. L. (2011). Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films. Journal of the Electrochemical Society, 158(4), G92-G96. https://doi.org/10.1149/1.3205041