I. Poulios

Landheer, K., Goedheer, W. J., Poulios, I., Schropp, R. E. I., & Rath, J. K. (2016). Chemical sputtering by H2+ and H3+ ions during silicon deposition. Journal of Applied Physics, 120(5), 053304. https://doi.org/10.1063/1.4960351 (Original work published 2016)

Landheer, K., Goedheer, W. J., Poulios, I., Schropp, R. E. I., & Rath, J. K. (2016). Ion bombardment measurements and simulations of a low temperature VHF PECVD SiH4-H2 discharge in the a-Si:H to μc-Si:H transition regime. Physica Status Solidi A - Applications and Materials Science, 213(7), 1680–1685. https://doi.org/10.1002/pssa.201532917

Mohan, A., Schropp, R. E. I., Poulios, I., Goedheer, W. J., & Rath, J. K. (2016). Optimizing the parameter space for increased crystallinity of silicon nanoparticles grown in the gas phase. Physica Status Solidi A - Applications and Materials Science, 213(7), 1826–1830. https://doi.org/10.1002/pssa.201670645