DIFFER
DIFFER Publication
Author | |
Abstract |
We studied ion bombardment during amorphous silicon layer deposition for hydrogen dilutions 5 to 59 with mass resolved IED measurements and simulations. The trends in the peak position of H2+ and SiHy+ IEDs with increasing hydrogen dilution show good agreement between measurements and simulations. A difference in asymmetry of the discharge between simulations and measurements results in a roughly 6 eV lower peak position for the simulations. An increasing SiHy+ ion flux with increasing hydrogen dilution is measured. We hypothesize that this is due to amorphous silicon etching that is enhanced by Hy+ ion bombardment. |
Year of Publication |
2016
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Journal |
Physica Status Solidi A - Applications and Materials Science
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Volume |
213
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Issue |
7
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Number of Pages |
1680–1685
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DOI |
10.1002/pssa.201532917
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PId |
df9ae2a6faae037d53c2079ac5b7a280
|
Alternate Journal |
Phys. Status Solidi A - Appl. Mat.
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Journal Article
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