K. Landheer

Landheer, K. ., Goedheer, W. J., Poulios, I. ., Schropp, R. E. I., & Rath, J. K. (2016). Chemical sputtering by H2+ and H3+ ions during silicon deposition. Journal of Applied Physics, 120(5), 053304. https://doi.org/10.1063/1.4960351 (Original work published 2016)

Landheer, K. ., Goedheer, W. J., Poulios, I. ., Schropp, R. E. I., & Rath, J. K. (2016). Ion bombardment measurements and simulations of a low temperature VHF PECVD SiH4-H2 discharge in the a-Si:H to μc-Si:H transition regime. Physica Status Solidi A - Applications and Materials Science, 213(7), 1680–1685. https://doi.org/10.1002/pssa.201532917