R. Lavrijsen

Sinha, R. ., Lavrijsen, R. ., Verheijen, M. A., Zoethout, E. ., Genuit, J. W., van de Sanden, M. C. M., & Bieberle, A. . (2019). Electrochemistry of Sputtered Hematite Photoanodes: A Comparison of Metallic DC versus Reactive RF Sputtering. ACS Omega, 4(5), 9262-9270. https://doi.org/10.1021/acsomega.8b03349

Zhao, Y. ., Brocks, G. ., Genuit, J. W., Lavrijsen, R. ., Verheijen, M. A., & Bieberle, A. . (2019). Boosting the Performance of WO3/n‐Si Heterostructures for Photoelectrochemical Water Splitting: from the Role of Si to Interface Engineering. Advanced Energy Materials, 9(26), 1900940. https://doi.org/10.1002/aenm.201900940 (Original work published 2019)

van Eden, G. G., Reinke, M. L., Brons, S. ., van der Bijl, G. ., Krijger, B. J. M., Lavrijsen, R. ., … Morgan, T. W. (2018). Plasma radiation studies in Magnum-PSI using resistive bolometry. Nuclear Fusion, 58(10), 106006. https://doi.org/10.1088/1741-4326/aad0a9

Zhao, Y. ., Balasubramanyam, S. ., Sinha, R. ., Lavrijsen, R. ., Verheijen, M. A., Bol, A. A., & Bieberle, A. . (2018). Physical and Chemical Defects in WO3 Thin Films and Their Impact on Photoelectrochemical Water Splitting. ACS Applied Energy Materials, 1(11), 5887-5895. https://doi.org/10.1021/acsaem.8b00849 (Original work published 2018)

Bieberle, A. ., Tanyeli, I. ., Lavrijsen, R. ., Koopmans, B. ., Sinha, R. ., & van de Sanden, M. C. M. (2017). Nanostructuring of iron thin films by high flux low energy helium plasma. Thin Solid Films, 631, 50-56. https://doi.org/10.1016/j.tsf.2017.04.007 (Original work published 2017)

Stoll, T. ., Zafeiropoulos, G. ., Dogan, I. ., Genuit, H. ., Lavrijsen, R. ., Koopmans, B. ., & Tsampas, M. N. (2017). Visible-light-promoted gas-phase water splitting using porous WO3/BiVO4 photoanodes. Electrochemistry Communications, 82, 47-51. https://doi.org/10.1016/j.elecom.2017.07.019 (Original work published 2017)

Sinha, R. ., Tanyeli, I. ., Lavrijsen, R. ., van de Sanden, M. C. M., & Bieberle, A. . (2017). The electrochemistry of iron oxide thin films nanostructured by high ion flux plasma exposure. Electrochimica Acta, 258, 709-717. https://doi.org/10.1016/j.electacta.2017.11.117 (Original work published 2017)