DIFFER

R. T.M. van Limpt

First name
R.
Middle name
T.M.
Last name
van Limpt
ORCID
0000-0002-9714-7070
van Limpt, R. T. (2025). Atomic Layer Deposition of Nickel Cobalt Oxides: Thin film model systems to identify novel merits of ALD in electrocatalysis (Eindhoven University of Technology). Eindhoven University of Technology, Eindhoven, Netherlands. Retrieved from https://research.tue.nl/nl/publications/atomic-layer-deposition-of-nickel-cobalt-oxides-thin-film-model-s (Original work published)
van Limpt, R. T., Lao, M., Verheijen, M. A., Tsampas, M. N., & Creatore, M. (2025). Thickness-Dependent Oxygen Evolution Reaction Performance of Atomic Layer Deposition Cobalt Oxide Nickel-Oxide Heterostacks. Journal of Physical Chemistry C, 129(28), 12859-12869. https://doi.org/10.1021/acs.jpcc.5c04002
van Limpt, R. T., Lao, M., Tsampas, M. N., & Creatore, M. (2024). Unraveling the Role of the Stoichiometry of Atomic Layer Deposited Nickel Cobalt Oxides on the Oxygen Evolution Reaction. Advanced Science, 11(32), 2405188. https://doi.org/10.1002/advs.202405188 (Original work published 2024)