Unraveling NO production in N2-O2 plasmas with 0D kinetic modeling and experimental validation
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Abstract |
;This work presents a detailed investigation aimed at understanding the key mechanisms governing nitric oxide (NO) production in N2–O2 discharges by systematically comparing experimental results to modeling data. The experimental phase capitalizes on radiofrequency (13.56 MHz) discharges, sustained at 5 mbar pressure conditions, featuring varying concentrations of oxygen, ranging from pure N2 plasma to air-like mixtures. On the modeling front, we adopt an integrated approach that combines the solution of the Boltzmann equation for electrons with a system of rate balance equations for heavy species. To account for ground state NO(X) generation at the reactor wall, we combine the volume chemistry with a mesoscopic description of the surface, taking into account adsorption sites and various elementary surface phenomena. Comparisons between experiments and modeling demonstrate very good agreement, extending beyond NO(X) formation to encompass other species in the plasma such as N2O(X) and atomic nitrogen N(4S). Noteworthy findings include (i) the pivotal role of surface mechanisms in NO(X) production, particularly at low oxygen content values; (ii) the significance of accurately describing the postdischarge phase, where depletion of plasma species occurs at different time scales (millisecond range); and (iii) the importance of vibrationally and electronically excited states (e.g., O2(b)) in elucidating NO(X) formation dynamics, crucial for unraveling reaction pathways and energy transfer processes. This work makes an important step toward formulating a comprehensive reaction mechanism for N2 and N2–O2 plasmas applied to nitrogen fixation, covering both volume and surface mechanisms, and lays a robust foundation for future research on plasma-based NO(X) production, particularly in the presence of catalysts. |
Year of Publication |
2024
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Journal |
Journal of Physical Chemistry A
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Volume |
128
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Issue |
34
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Number of Pages |
7235-7256
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Date Published |
08/2024
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DOI |
10.1021/acs.jpca.4c03323
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PId |
9d0d2f4be22c777e79070585c6f0efcc
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Alternate Journal |
J. Phys. Chem. A
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Label |
OA
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Journal Article
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