Improved temperature stability of Mo/Si multilayers by carbide based diffusion barriers through implantation of low energy CHx+ ions

TitleImproved temperature stability of Mo/Si multilayers by carbide based diffusion barriers through implantation of low energy CHx+ ions
Publication TypeJournal Article
Year of Publication2006
AuthorsL Alink, R.W.E. de Kruijs, E. Louis, F. Bijkerk, J. Verhoeven
JournalThin Solid Films
Volume510
Number1-2
Pagination26-31
Date PublishedJul
ISBN Number0040-6090
Accession NumberISI:000238011200005
URL<Go to ISI>://000238011200005
Division

nSI

Department

TFN

PID

9fc2c4666aca21be4306ef1bdc4a32cf

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