Spectral-purity-enhancing layer for multilayer mirrors

TitleSpectral-purity-enhancing layer for multilayer mirrors
Publication TypeJournal Article
Year of Publication2008
AuthorsM van Herpen, R de Kruijs, D.JW Klunder, E. Louis, A.E Yakshin, A S. van der Westen, F. Bijkerk, V. Banine
JournalOptics Letters
Volume33
Number6
Pagination560-562
Date PublishedMar
Type of ArticleArticle
ISBN Number0146-9592
Accession NumberISI:000254907500010
KeywordsEUV lithography, EXPOSURE, ION-BOMBARDMENT
Abstract

We demonstrate, both theoretically and experimentally, that special spectral-purity-enhancing multilayer mirror systems can be designed and fabricated to substantially reduce the level of out-of-band radiation expected in an extreme ultraviolet lithographic tool. A first proof of principle of applying such spectral-purity-enhancement layers showed reduced out-of-band reflectance by a factor of five, while the in-band reflectance is only 4.5% (absolute) less than for a standard capped multilayer. (C) 2008 Optical Society of America.

URL<Go to ISI>://000254907500010
Division

nSI

PID

3ab530045c157b1366808da0c11eb55b

Alternate TitleOpt. Lett.

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