Infrared suppression by hybrid EUV multilayer-IR etalon structures

TitleInfrared suppression by hybrid EUV multilayer-IR etalon structures
Publication TypeJournal Article
Year of Publication2011
AuthorsV.V Medvedev, A.E Yakshin, R.WE van de Kruijs, V.M Krivtsun, A.M Yakunin, K.N Koshelev, F. Bijkerk
JournalOptics Letters
Volume36
Issue17
Pagination3344-3346
Date PublishedSep
Type of ArticleArticle
ISBN Number0146-9592
KeywordsEXTREME-ULTRAVIOLET, LAYERS, mirrors
Abstract

We have developed a multilayer mirror for extreme UV (EUV) radiation (13.5nm), which has near-zero reflectance for IR line radiation (10.6 mu m). The EUV reflecting multilayer is based on alternating B(4)C and Si layers. Substantial transparency of these materials with respect to the IR radiation allowed the integration of the multilayer coating in a resonant quarter-wave structure for 10.6 mu m. Samples were manufactured using magnetron sputtering deposition technique and demonstrated suppression of the IR radiation by up to 3 orders of magnitude. The EUV peak reflectance amounts 45% at 13: 5nm, with a bandwidth at FWHM being 0.284 nm. Therefore such a mirror could replace conventional multilayer mirrors to suppress undesired spectral components in monochromatic imaging applications, including EUV photolithography. (C) 2011 Optical Society of America

DOI10.1364/OL.36.003344
Division

nSI

Department

TFM

PID33f3fbc6b00588ab08f7b7cc7f28c24d
Alternate TitleOpt. Lett.

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