Phase characterization of the reflection on an extreme UV multilayer: comparison between attosecond metrology and standing wave measurements

TitlePhase characterization of the reflection on an extreme UV multilayer: comparison between attosecond metrology and standing wave measurements
Publication TypeJournal Article
Year of Publication2011
AuthorsR.A Loch, A. Dubrouil, R. Sobierajski, D. Descamps, B. Fabre, P. Lidon, R.WE van de Kruijs, F. Boekhout, E. Gullikson, J. Gaudin, E. Louis, F. Bijkerk, E. Mevel, S. Petit, E. Constant, Y. Mairesse
JournalOptics Letters
Volume36
Issue17
Pagination3386-3388
Date PublishedSep
Type of ArticleArticle
ISBN Number0146-9592
Keywordsmirrors, PULSES, SYNCHRONIZATION
Abstract

We characterize the phase shift induced by reflection on a multilayer mirror in the extreme UV range (80-93 eV) using two techniques: one based on high order harmonic generation and attosecond metrology (reconstruction of attosecond beating by interference of two-photon transitions), and a second based on synchrotron radiation and measurements of standing waves (total electron yield). We find an excellent agreement between the results from the two measurements and a flat group delay shift (+/- 40 as) over the main reflectivity peak of the mirror. (C) 2011 Optical Society of America

DOI10.1364/OL.36.003386
Division

nSI

Department

AXO

PIDcd53f695d377735edc61fbfab477e934
Alternate TitleOpt. Lett.

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