Wavelength separation from extreme ultraviolet mirrors using phaseshift reflection

TitleWavelength separation from extreme ultraviolet mirrors using phaseshift reflection
Publication TypeJournal Article
Year of Publication2012
AuthorsA.JR van den Boogaard, F.A van Goor, E. Louis, F. Bijkerk
JournalOptics Letters
Volume37
Number2
Pagination160-162
Date PublishedJan
Type of ArticleArticle
ISBN Number0146-9592
KeywordsFABRICATION, multilayer, OPTICS
Abstract

A generic design and fabrication scheme of Mo/Si multilayer-grating phaseshift reflector systems is reported. Close to optimized extreme ultraviolet (EUV, lambda = 13.5 nm) reflectance values up to 64% are demonstrated, while the diffractive properties can be exploited in spectral filtering applications. The results can contribute to a wavelength-unspecific solution for the suppression of lambda > 100 nm out-of-band radiation in EUV lithography. (C) 2012 Optical Society of America

URLhttp://www.opticsinfobase.org/ol/abstract.cfm?uri=ol-37-2-160
DOI10.1364/OL.37.000160
Division

nSI

Department

AXO

PID

2fc33efae2030f4acc84336b941c302a

Alternate TitleOpt. Lett.

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