| Title | Wavelength separation from extreme ultraviolet mirrors using phaseshift reflection |
| Publication Type | Journal Article |
| Year of Publication | 2012 |
| Authors | A.JR van den Boogaard, F.A van Goor, E. Louis, F. Bijkerk |
| Journal | Optics Letters |
| Volume | 37 |
| Number | 2 |
| Pagination | 160-162 |
| Date Published | Jan |
| Type of Article | Article |
| ISBN Number | 0146-9592 |
| Keywords | FABRICATION, multilayer, OPTICS |
| Abstract | A generic design and fabrication scheme of Mo/Si multilayer-grating phaseshift reflector systems is reported. Close to optimized extreme ultraviolet (EUV, lambda = 13.5 nm) reflectance values up to 64% are demonstrated, while the diffractive properties can be exploited in spectral filtering applications. The results can contribute to a wavelength-unspecific solution for the suppression of lambda > 100 nm out-of-band radiation in EUV lithography. (C) 2012 Optical Society of America |
| URL | http://www.opticsinfobase.org/ol/abstract.cfm?uri=ol-37-2-160 |
| DOI | 10.1364/OL.37.000160 |
| Division | nSI |
| Department | AXO |
| PID | 2fc33efae2030f4acc84336b941c302a |
| Alternate Title | Opt. Lett. |
Go back one page.
