Structural properties of subnanometer thick Y layers in extreme ultraviolet multilayer mirrors

TitleStructural properties of subnanometer thick Y layers in extreme ultraviolet multilayer mirrors
Publication TypeJournal Article
Year of Publication2012
AuthorsJ. Bosgra, E. Zoethout, A.MJ van der Eerden, J. Verhoeven, R.WE van de Kruijs, A.E Yakshin, F. Bijkerk
JournalApplied Optics
Volume51
Number36
Pagination8541-8548
Date Published2012/12/13
Type of ArticleJournal article
Abstract

We studied the structure and optical properties of B 4 C/Mo/Y/Si multilayer systems. Using extended x-ray absorption fine structure measurements at the Y and Mo K-edge, the structure of the subnanometer thick Y layer and the underlying Mo layer were analyzed. It was found that even a 0.2 nm thick Y layer significantly reduced silicon diffusion toward Mo, thus reducing Mo silicide formation. Hard x-ray reflectometry showed that the difference in average interface roughness of the B 4 C/Mo/Y/Si multilayer structure compared to Mo/Si and B 4 C/Mo/B 4 C/Si multilayer structures was negligible. Soft x-ray reflectometry showed optical improvement of B 4 C/Mo/Y/Si with respect to Mo/Si and B 4 C/Mo/B 4 C/Si multilayer structures.

URLhttp://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-51-36-8541
DOI10.1364/AO.51.008541
Division

nSI

Department

TFM

PID

5b1ce4b3c8b9d56e0613e4b325d26061

Alternate TitleAppl. Opt.

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