Wavelength selection for multilayer coatings for lithography generation beyond extreme ultraviolet

TitleWavelength selection for multilayer coatings for lithography generation beyond extreme ultraviolet
Publication TypeJournal Article
Year of Publication2012
AuthorsI. Makhotkin, E. Zoethout, E. Louis, A.M Yakunin, S. Muellender, F. Bijkerk
JournalJournal of Micro/Nanolithography, MEMS and MOEMS
Volume11
Start Page040501-1
Number4
Pagination040501
Date Published19-Oct-12
Type of ArticleJournal article
KeywordsJM3 Letters
Abstract

The spectral properties of LaN/B and LaN∕B4C multilayer mirrors have been investigated in the 6.5 to 6.9 nm wavelength range, based on measured B and B4C optical constants. We show that the wavelength of optimal reflectance for boron-based optics is between 6.63 and 6.65 nm, depending on the boron chemical state. The wavelength of the maximum reflectance of the LaN∕B4C multilayer system is confirmed experimentally. Calculations of the wavelength-integrated reflectance for perfect ten-multilayer-mirror stacks show that a B-based optical column can be optimized for a wavelength larger than 6.65 nm.

DOI10.1117/1.JMM.11.4.040501
Division

nSI

Department

AXO

PIDd04eded6ff93f68fcdbd712ae2d7ce2a
Alternate TitleJ. Micro-Nanolithogr. MEMS MOEMS
LabelOA

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