|Title||Wavelength selection for multilayer coatings for lithography generation beyond extreme ultraviolet|
|Publication Type||Journal Article|
|Year of Publication||2012|
|Authors||I. Makhotkin, E. Zoethout, E. Louis, A.M Yakunin, S. Muellender, F. Bijkerk|
|Journal||Journal of Micro/Nanolithography, MEMS and MOEMS|
|Type of Article||Journal article|
The spectral properties of LaN/B and LaN∕B4C multilayer mirrors have been investigated in the 6.5 to 6.9 nm wavelength range, based on measured B and B4C optical constants. We show that the wavelength of optimal reflectance for boron-based optics is between 6.63 and 6.65 nm, depending on the boron chemical state. The wavelength of the maximum reflectance of the LaN∕B4C multilayer system is confirmed experimentally. Calculations of the wavelength-integrated reflectance for perfect ten-multilayer-mirror stacks show that a B-based optical column can be optimized for a wavelength larger than 6.65 nm.
|Alternate Title||J. Micro-Nanolithogr. MEMS MOEMS|
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