Design of an Extended Image Field Soft-X-Ray Projection System

TitleDesign of an Extended Image Field Soft-X-Ray Projection System
Publication TypeJournal Article
Year of Publication1992
AuthorsH.J Voorma, F. Bijkerk
JournalMicroelectronic Engineering
Volume17
Number1-4
Pagination145-148
Date PublishedMar
ISBN Number0167-9317
Abstract

A soft-x-ray projection system has been designed, which consists of spherical components to be coated with multilayer reflection coatings. In the design, a two-mirror system and a spherical reflection mask, the optical aberrations were minimized. The design enables a resolution of sub-100 nm over a circular image field with a diameter of 4 mm at a wavelength of 10.5 nm. The assembly tolerances of the system and the fabrication tolerances of the substrates have been calculated. The surface roughness determined from our superpolished quartz substrates amounts to 0.3 nm, which is sufficient to meet the required specifications.

DOI10.1016/0167-9317(92)90029-q
PID

bfabb8d18aaab4614b2f2c7ea418f293

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