Effect of gas properties on the dynamics of the electrical slope asymmetry effect in capacitive plasmas: comparison of Ar, H2 and CF4

TitleEffect of gas properties on the dynamics of the electrical slope asymmetry effect in capacitive plasmas: comparison of Ar, H2 and CF4
Publication TypeJournal Article
Year of Publication2016
AuthorsB. Bruneau, T. Lafleur, T. Gans, D. O’Connell, A. Greb, I. Korolov, A. Derzsi, Z. Donko, S. Brandt, P. Diomede, E. Schüngel, J. Schulze, D.J Economou, S. Longo, E. Johnson, J.P Booth
JournalPlasma Sources Science and Technology
Volume25
Issue1
Pagination01LT02
Abstract

Tailored voltage excitation waveforms provide an efficient control of the ion energy (through the electrical asymmetry effect) in capacitive plasmas by varying the ‘amplitude’ asymmetry of the waveform. In this work, the effect of a ‘slope’ asymmetry of the waveform is investigated by using sawtooth-like waveforms, through which the sheath dynamic can be manipulated. A remarkably different discharge dynamic is found for Ar, H 2 , and CF 4 gases, which is explained by the different dominant electron heating mechanisms and plasma chemistries. In comparison to Argon we find that the electrical asymmetry can even be reversed by using an electronegative gas such as CF 4 . Phase resolved optical emission spectroscopy measurements, probing the spatiotemporal distribution of the excitation rate show excellent agreement with the results of particle-in-cell simulations, confirming the high degree of correlation between the excitation rates with the dominant heating mechanisms in the various gases. It is shown that, depending on the gas used, sawtooth-like voltage waveforms may cause a strong asymmetry.

DOI10.1088/0963-0252/25/1/01LT02
Division

FP

Department

CPPC

PID

48cdb579ac76489b8cdefbdfb99ce317

Alternate TitlePlasma Sources Sci. Technol.
LabelOA

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