Mechanism for orientation dependence of blisters on W surface exposed to D plasma at low temperature

TitleMechanism for orientation dependence of blisters on W surface exposed to D plasma at low temperature
Publication TypeJournal Article
Year of Publication2016
AuthorsY.Z Jia, W. Liu, B. Xu, G.N Luo, S.L Qu, T.W Morgan, G. De Temmerman
JournalJournal of Nuclear Materials
Volume477
Pagination165-171
Abstract

The orientation dependence of blister formation induced by D plasma exposure at low temperature (about 523 K) on rolled tungsten and chemical vapor deposition (CVD) W samples was studied by scanning electron microscopy and electron backscatter diffraction. Severe blistering was observed on grains with surface normal directions close to [111], while the [001] surfaces are the most resistant to blister formation. Cavities induced by D2 gas were observed beneath [111], [110] and [001] surfaces, independently on whether blisters were observed on the surface or not. The [111] surface is more prone to blister formation, because it is easily plastically deformed by the D2 gas pressure. Some blister edges and steps were perpendicular to [110] directions, which may be induced by the slipping of dislocations on {110} planes. The blister morphology induced by D plasma can be well explained by the blister model based on plastic deformation mechanism.

DOI10.1016/j.jnucmat.2016.05.011
Division

PSI

Department

PSI-E

PID

7fbc231179655cd31cff1045e55cf570

Alternate TitleJ. Nucl. Mater.

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