Exploring the electron density in plasma induced by EUV radiation: II. Numerical studies in argon and hydrogen

TitleExploring the electron density in plasma induced by EUV radiation: II. Numerical studies in argon and hydrogen
Publication TypeJournal Article
Year of Publication2016
AuthorsD.I Astakhov, W.J Goedheer, C.J Lee, V.V Ivanov, V.M Krivtsun, K.N Koshelev, D.V Lopaev, R.M van der Horst, J. Beckers, E.A Osorio, F. Bijkerk
JournalJournal of Physics D: Applied Physics
Volume49
Issue29
Pagination295204
Abstract

We used numerical modeling to study the evolution of EUV-induced plasmas in argon and hydrogen. The results of simulations were compared to the electron densities measured by microwave cavity resonance spectroscopy. It was found that the measured electron densities can be used to derive the integral amount of plasma in the cavity. However, in some regimes, the impact of the setup geometry, EUV spectrum, and EUV induced secondary emission should be taken into account. The influence of these parameters on the generated plasma and the measured electron density is discussed.

URLhttp://arxiv.org/abs/1603.08130
DOI10.1088/0022-3727/49/29/295204
Division

FP

Department

TP

PID8d71644a9a722605f42d8c7f3cab1cfb
Alternate TitleJ. Phys. D: Appl. Phys.
LabelOA

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