| Title | Enhancement of Reflectivity of Multilayer Mirrors for Soft-X-Ray Projection Lithography by Temperature Optimization and Ion-Bombardment |
| Publication Type | Journal Article |
| Year of Publication | 1994 |
| Authors | E. Louis, H.J Voorma, N.B Koster, L. Shmaenok, F. Bijkerk, R. Schlatmann, J. Verhoeven, Y.Y Platonov, G.E van Dorssen, H.A Padmore |
| Journal | Microelectronic Engineering |
| Volume | 23 |
| Number | 1-4 |
| Pagination | 215-218 |
| Date Published | Jan |
| ISBN Number | 0167-9317 |
| Abstract | In this paper we discuss two techniques to optimize the quality of multilayer x-ray mirrors, namely optimization of the temperature of the substrates during deposition and ion-bombardment of the layers. We produced Mo/Si multilayers applying both methods and present the effect on the near normal incidence reflectivity for lambda=13-14 nm radiation. Furthermore an analysis of the homogeneity of the deposited layers is given. |
| DOI | 10.1016/0167-9317(94)90140-6 |
| PID | 7b9d82cb984e22597b6c456e0f52cb51 |
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