Enhancement of Reflectivity of Multilayer Mirrors for Soft-X-Ray Projection Lithography by Temperature Optimization and Ion-Bombardment

TitleEnhancement of Reflectivity of Multilayer Mirrors for Soft-X-Ray Projection Lithography by Temperature Optimization and Ion-Bombardment
Publication TypeJournal Article
Year of Publication1994
AuthorsE. Louis, H.J Voorma, N.B Koster, L. Shmaenok, F. Bijkerk, R. Schlatmann, J. Verhoeven, Y.Y Platonov, G.E van Dorssen, H.A Padmore
JournalMicroelectronic Engineering
Volume23
Number1-4
Pagination215-218
Date PublishedJan
ISBN Number0167-9317
Abstract

In this paper we discuss two techniques to optimize the quality of multilayer x-ray mirrors, namely optimization of the temperature of the substrates during deposition and ion-bombardment of the layers. We produced Mo/Si multilayers applying both methods and present the effect on the near normal incidence reflectivity for lambda=13-14 nm radiation. Furthermore an analysis of the homogeneity of the deposited layers is given.

DOI10.1016/0167-9317(94)90140-6
PID

7b9d82cb984e22597b6c456e0f52cb51

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