Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction

TitleAtomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
Publication TypeJournal Article
Year of Publication2019
AuthorsV. di Palma, G. Zafeiropoulos, T. Goldsweer, W.MM Kessels, M.CM van de Sanden, M. Creatore, M.N Tsampas
JournalElectrochemistry Communications
Volume98
Pagination73-77
Date Published01/2019
Abstract

Electrodeposited cobalt phosphate has been reported as a valid alternative to noble metals as an electrocatalyst for the Oxygen Evolution Reaction (OER). In parallel, Atomic Layer Deposition (ALD) is increasingly being used in (photo)electrocatalytic applications. In this contribution we report on the electrocatalytic activity towards OER of ALD-prepared cobalt phosphate thin films. The selected ALD approach enables tuning of the Co-to-P atomic ratio, which is found to significantly affect the activity of the prepared electrocatalyst. Specifically, concurrently with a Co-to-P ratio increase from 1.6 to 1.9, the current density for OER increases from 1.77 mA/cm2 at 1.8 V vs. RHE (Reversible Hydrogen Electrode) to 2.89 mA/cm2 at 1.8 V vs. RHE. Moreover the sample with a Co-to-P ratio of 1.9 has superior performance when compared to electrodeposited cobalt phosphate thin films reported in the literature.

DOI10.1016/j.elecom.2018.11.021
Division

MaSF

Department

CEPEA

PID18a156f4c910e809c6ba5bf83117c19c
Alternate TitleElectrochem. Commun.
LabelOA

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