| Title | Extreme UV lithography: A new laser plasma target concept and fabrication of multilayer reflection masks |
| Publication Type | Journal Article |
| Year of Publication | 1996 |
| Authors | F. Bijkerk, L.A Shmaenok, E. Louis, H.J Voorma, N.B Koster, C. Bruineman, R Bastiaensen, E.WJM van der Drift, J. Romijn, L.EM de Groot, B.AC Rousseeuw, T. Zijlstra, Y.Y Platonov, N.N Salashchenko |
| Journal | Microelectronic Engineering |
| Volume | 30 |
| Number | 1-4 |
| Pagination | 183-186 |
| Date Published | Jan |
| ISBN Number | 0167-9317 |
| Abstract | Results are reported on the development of a laser plasma source and the fabrication of multilayer reflection masks for extreme ultra-violet lithography (EUVL). A new concept of a target for a laser plasma source is presented including experimental evidence of elimination of macro debris particles from the source. Concerning the fabrication of reflection masks, a new method is described involving a two-layer absorber system protecting the Mo-Si structure against etching damage. |
| DOI | 10.1016/0167-9317(95)00222-7 |
| PID | 4b35e2c0ed03b6623752dc4c2f2e69fb |
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