Title | Extreme UV lithography: A new laser plasma target concept and fabrication of multilayer reflection masks |
Publication Type | Journal Article |
Year of Publication | 1996 |
Authors | F. Bijkerk, L.A Shmaenok, E. Louis, H.J Voorma, N.B Koster, C. Bruineman, R Bastiaensen, E.WJM van der Drift, J. Romijn, L.EM de Groot, B.AC Rousseeuw, T. Zijlstra, Y.Y Platonov, N.N Salashchenko |
Journal | Microelectronic Engineering |
Volume | 30 |
Number | 1-4 |
Pagination | 183-186 |
Date Published | Jan |
ISBN Number | 0167-9317 |
Abstract | Results are reported on the development of a laser plasma source and the fabrication of multilayer reflection masks for extreme ultra-violet lithography (EUVL). A new concept of a target for a laser plasma source is presented including experimental evidence of elimination of macro debris particles from the source. Concerning the fabrication of reflection masks, a new method is described involving a two-layer absorber system protecting the Mo-Si structure against etching damage. |
DOI | 10.1016/0167-9317(95)00222-7 |
PID | 4b35e2c0ed03b6623752dc4c2f2e69fb |
Go back one page.