|Title||Peak and Integrated reflectivity, wavelength and gamma optimization of Mo/Si, and Mo/Be multilayer, multielement optics for extreme ultraviolet lithography|
|Publication Type||Journal Article|
|Year of Publication||1999|
|Authors||R. Stuik, E. Louis, A.E Yakshin, P.C Gorts, E.LG Maas, F. Bijkerk, D. Schmitz, F. Scholze, G. Ulm, M. Haidl|
|Journal||Journal of Vacuum Science & Technology B|
Reported is the optimization of the fabrication of Mo/Si multilayer systems produced by e-beam evaporation and ion-beam smoothening. The impact of a number of coating parameters is verified such as variation of the mirror's center wavelength and the metal fraction of the bilayer (Gamma ratio), resulting in reflectivities up to 68.6% at normal incidence. Parallel to this experimental work, a numerical optimization based on experimentally determined multilayer properties is carried out on the throughput of multimirror lithographic systems for the 11-15 nm wavelength region using Mo/Si and Mo/Be coatings. The center wavelength, Gamma ratio and layer stack have been optimized. The calculations show an optimum throughput for a 10-mirror Mo/Si system at 14.4 nm, assuming a light source with a wavelength independent spectrum. (C) 1999 American Vacuum Society. [S0734-211X(99)12106-1].
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