Peak and Integrated reflectivity, wavelength and gamma optimization of Mo/Si, and Mo/Be multilayer, multielement optics for extreme ultraviolet lithography

TitlePeak and Integrated reflectivity, wavelength and gamma optimization of Mo/Si, and Mo/Be multilayer, multielement optics for extreme ultraviolet lithography
Publication TypeJournal Article
Year of Publication1999
AuthorsR. Stuik, E. Louis, A.E Yakshin, P.C Gorts, E.LG Maas, F. Bijkerk, D. Schmitz, F. Scholze, G. Ulm, M. Haidl
JournalJournal of Vacuum Science & Technology B
Volume17
Number6
Pagination2998-3002
Date PublishedNov-Dec
ISBN Number1071-1023
Abstract

Reported is the optimization of the fabrication of Mo/Si multilayer systems produced by e-beam evaporation and ion-beam smoothening. The impact of a number of coating parameters is verified such as variation of the mirror's center wavelength and the metal fraction of the bilayer (Gamma ratio), resulting in reflectivities up to 68.6% at normal incidence. Parallel to this experimental work, a numerical optimization based on experimentally determined multilayer properties is carried out on the throughput of multimirror lithographic systems for the 11-15 nm wavelength region using Mo/Si and Mo/Be coatings. The center wavelength, Gamma ratio and layer stack have been optimized. The calculations show an optimum throughput for a 10-mirror Mo/Si system at 14.4 nm, assuming a light source with a wavelength independent spectrum. (C) 1999 American Vacuum Society. [S0734-211X(99)12106-1].

DOI10.1116/1.590942
PID

fd7635339941d1ecf204ab1ce4b9424c

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