Publications

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2015
D.I Astakhov, W.J Goedheer, C.J Lee, V.V Ivanov, V.M Krivtsun, A.I Zotovich, S.M Zyryanov, D.V Lopaev, F. Bijkerk,  Plasma probe characteristics in low density hydrogen pulsed plasmas, Plasma Sources Sci. Technol. 24 (2015) 055018.
V.V Medvedev, J. Yang, A.J Schmidt, A.E Yakshin, R.WE van de Kruijs, E. Zoethout, F. Bijkerk,  Anisotropy of heat conduction in Mo/Si multilayers, J. Appl. Phys. 118 (2015) 085101.
A. Dolgov, D. Lopaev, C.J Lee, E. Zoethout, V. Medvedev, O. Yakushev, F. Bijkerk,  Characterization of carbon contamination under ion and hot atom bombardment in a tin-plasma extreme ultraviolet light source, Appl. Surf. Sci. 353 (2015) 708-713.
2014
A.S Kuznetsov, M.A Gleeson, F. Bijkerk,  Temperature dependencies of hydrogen-induced blistering of thin film multilayers, J. Appl. Phys. 115 (2014) 173510.
OA PDF icon 2014_56992.pdf (633.32 KB)
A. Dolgov, D. Lopaev, T. Rachimova, A. Kovalev, A. Vasil'Eva, C.J Lee, V.M Krivtsun, O. Yakushev, F. Bijkerk,  Comparison of H2 and He carbon cleaning mechanisms in extreme ultraviolet induced and surface wave discharge plasmas, J. Phys. D-Appl. Phys. 47 (2014) 065205.
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M. Bayraktar, F.A van Goor, K.J Boller, F. Bijkerk,  Spectral purification and infrared light recycling in extreme ultraviolet lithography sources, Opt. Express 22 (2014) 8633-8639.
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S.N Yakunin, I.A Makhotkin, R.WE van de Kruijs, M.A Chuev, E.M. Pashaev, E. Zoethout, E. Louis, Y S. Seregin, I.A. Subbotin, D.V Novikov et al.,  Model independent X-ray standing wave analysis of periodic multilayer structures, J. Appl. Phys. 115 (2014) 134303.
Q. Huang, M. de Boer, J. Barreaux, R. van der Meer, E. Louis, F. Bijkerk,  High efficiency structured EUV multilayer mirror for spectral filtering of long wavelengths, Opt. Express 22 (2014) 19365-19374.
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S.N Yakunin, I.A Makhotkin, K.V Nikolaev, R.WE van de Kruijs, M.A Chuev, F. Bijkerk,  Combined EUV reflectance and X-ray reflectivity data analysis of periodic multilayer structures, Opt. Express 22 (2014) 20076–20086.
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A. Gao, C.J Lee, F. Bijkerk,  Graphene defect formation by extreme ultraviolet generated photoelectrons, J. Appl. Phys. 5116 (2014) 054312.
S.P Huber, R.WE van de Kruijs, A.E Yakshin, E. Zoethout, K.-J. Boller, F. Bijkerk,  Subwavelength single layer absorption resonance antireflection coatings, Opt. Express 122 (2014) 490–497.
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A. Gao, E. Zoethout, J.M Sturm, C.J Lee, F. Bijkerk,  Defect formation in single layer graphene under extreme ultraviolet irradiation, Appl. Surf. Sci. 317 (2014) 745-751.
2013
R. van der Meer, I Kozhevnikov, B Krishnan, J Huskens, P Hegeman, C Brons, B Vratzov, B Bastiaens, K Boller, F. Bijkerk,  Single-order operation of lamellar multilayer gratings in the soft x-ray spectral range, AIP Adv. 13 (2013) 012103.
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E. Zoethout, E. Louis, F. Bijkerk,  Real-space insight in the nanometer scale roughness development during growth and ion beam polishing of molybdenum silicon multilayer films, Appl. Surf. Sci. 285, Part B (2013) 293-299.
J.M Sturm, C.J Lee, F. Bijkerk,  Reactions of ethanol on Ru(0001), Surf. Sci. 612 (2013) 42-47.
V.V Medvedev, R.WE van de Kruijs, A.E Yakshin, N.N Novikova, V.M Krivtsun, E. Louis, A.M Yakunin, F. Bijkerk,  Multilayer mirror with enhanced spectral selectivity for the next generation extreme ultraviolet lithography, Appl. Phys. Lett. 22103 (2013) 221114.
J. Bosgra, L.W Veldhuizen, E. Zoethout, J. Verhoeven, R.A Loch, A.E Yakshin, F. Bijkerk,  Interactions of C in layered Mo-Si structures, Thin Solid Films 542 (2013) 210-213.
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A. Gao, P.J Rizo, E. Zoethout, L. Scaccabarozzi, C.J Lee, V. Banine, F. Bijkerk,  Extreme ultraviolet induced defects on few-layer graphene, J. Appl. Phys. 4114 (2013) 044313.
S.L Nyabero, R.WE van de Kruijs, A.E Yakshin, F. Bijkerk,  Enhanced thermal stability of extreme ultraviolet multilayers by balancing diffusion-induced structural changes, Appl. Phys. Lett. 9103 (2013) 093105.
A.S Kuznetsov, M.A Gleeson, F. Bijkerk,  Ion effects in hydrogen-induced blistering of Mo/Si multilayers, J. Appl. Phys. 114 (2013) 113507.
OA PDF icon 2013_53977.pdf (561.76 KB)

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