Publications

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Author Title Type [ Year(Asc)]
Filters: Author is Bogaerts, A.  [Clear All Filters]
2020
S. van Alphen, V. Vermeiren, T.D Butterworth, D.CM van den Bekerom, G.J van Rooij, A. Bogaerts,  Power Pulsing To Maximize Vibrational Excitation Efficiency in N2 Microwave Plasma: A Combined Experimental and Computational Study, J. Phys. Chem. C 124 (2020) 1765-1779.
2019
A. Bogaerts, X. Tu, G.J van Rooij, M.CM van de Sanden,  Plasma-based CO2 conversion, Carbon Dioxide Utilization: From Fundamentals to Production Processes 2 (2019) 585-634.
R. Brandenburg, A. Bogaerts, W. Bongers, A. Fridman, G. Fridman, B.R Locke, V. Miller, S. Reuter, M. Schiorlin, T. Verreycken et al.,  White paper on the future of plasma science in environment, for gas conversion and agriculture, Plasma Process. Polym. 16 (2019) 1700238.
OA 
2017
I Adamovich, SD Baalrud, A. Bogaerts, PJ Bruggeman, M Cappelli, V Colombo, U Czarnetzki, U Ebert, JG Eden, M.CM van de Sanden et al.,  The 2017 Plasma Roadmap: Low temperature plasma science and technology, J. Phys. D: Appl. Phys. 50 (2017) 323001.
OA 
T. Nozaki, A. Bogaerts, X. Tu, M.CM van de Sanden,  Special issue: Plasma Conversion, Plasma Process. Polym. 14 (2017) 1790061.
OA 
2016
A. Bogaerts, M.CM van de Sanden,  Special Issue of Papers by Plenary and Topical Invited Lecturers at the 22nd International Symposium on Plasma Chemistry (ISPC 22), 5-10 July 2015, Antwerp, Belgium: Introduction, Plasma Chem. Plasma P. 36 (2016) 1-2.
OA 
2015
M. North, P. Abrantes, E. Remiezowicz, A. Bardow, J. Dodson, T. Manning, J. Albo, D. Reed, D. Harris, I. Ingram et al.,  CO2 reduction reactions: general discussion, Faraday Discuss. 183 (2015) 261-290.
2010
J.P Ning, X.D Lu, C.L Zhao, Y.M Qin, P.N He, A. Bogaerts, F.J Gou,  Molecular dynamics simulation of temperature effects on CF3+ etching of Si surface, Acta Phys. Sin. 1059 (2010) 7225-7231.
2006
K. De Bleecker, A. Bogaerts, W. Goedheer,  Aromatic ring generation as a dust precursor in acetylene discharges, Applied Physics Letters 1588 (2006) 
K. De Bleecker, A. Bogaerts, W. Goedheer,  Detailed modeling of hydrocarbon nanoparticle nucleation in acetylene discharges, Physical Review E 273 (2006) 
K. De Bleecker, A. Bogaerts, W. Goedheer,  Modelling of nanoparticle coagulation and transport dynamics in dusty silane discharges, New Journal of Physics 8 (2006) 
2005
K. De Bleecker, A. Bogaerts, W. Goedheer,  Role of the thermophoretic force on the transport of nanoparticles in dusty silane plasmas, Physical Review E 671 (2005) 
2004
K. De Bleecker, A. Bogaerts, W. Goedheer, R. Gijbels,  Investigation of growth mechanisms of clusters in a silane discharge with the use of a fluid model, IEEE Transactions on Plasma Science 232 (2004) 691-698.
K. De Bleecker, A. Bogaerts, R. Gijbels, W. Goedheer,  Numerical investigation of particle formation mechanisms in silane discharges, Physical Review E 569 (2004) 
K. De Bleecker, A. Bogaerts, W. Goedheer,  Modeling of the formation and transport of nanoparticles in silane plasmas, Physical Review E 570 (2004) 
2003
D. Herrebout, A. Bogaerts, R. Gijbels, W.J Goedheer, A. Vanhulsel,  A one-dimensional fluid model for an acetylene RF discharge: A study of the plasma chemistry, IEEE Transactions on Plasma Science 431 (2003) 659-664.
2001
A. Bogaerts, R. Gijbels, W. Goedheer,  Improved hybrid Monte Carlo-fluid model for the electrical characteristics in an analytical radio-frequency glow discharge in argon, Journal of Analytical Atomic Spectrometry 716 (2001) 750-755.
M. Yan, A. Bogaerts, R. Gijbels, W.J Goedheer,  Kinetic modeling of relaxation phenomena after photodetachment in a rf electronegative SiH4 discharge, Physical Review E 263 (2001) 
D. Herrebout, A. Bogaerts, M. Yan, R. Gijbels, W. Goedheer, E. Dekempeneer,  One-dimensional fluid model for an rf methane plasma of interest in deposition of diamond-like carbon layers, Journal of Applied Physics 290 (2001) 570-579.
2000
M. Yan, A. Bogaerts, R. Gijbels, W.J Goedheer,  Spatial behavior of energy relaxation of electrons in capacitively coupled discharges: Comparison between Ar and SiH4, Journal of Applied Physics 887 (2000) 3628-3636.

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