Publications
Power Pulsing To Maximize Vibrational Excitation Efficiency in N2 Microwave Plasma: A Combined Experimental and Computational Study, J. Phys. Chem. C 124 (2020) 1765-1779.
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Plasma-based CO2 conversion, Carbon Dioxide Utilization: From Fundamentals to Production Processes 2 (2019) 585-634.
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2019_69788.pdf (2.18 MB)
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White paper on the future of plasma science in environment, for gas conversion and agriculture, Plasma Process. Polym. 16 (2019) 1700238.
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The 2017 Plasma Roadmap: Low temperature plasma science and technology, J. Phys. D: Appl. Phys. 50 (2017) 323001.
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Molecular dynamics simulation of temperature effects on CF3+ etching of Si surface, Acta Phys. Sin. 1059 (2010) 7225-7231.
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Aromatic ring generation as a dust precursor in acetylene discharges, Applied Physics Letters 1588 (2006)
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Detailed modeling of hydrocarbon nanoparticle nucleation in acetylene discharges, Physical Review E 273 (2006)
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Modelling of nanoparticle coagulation and transport dynamics in dusty silane discharges, New Journal of Physics 8 (2006)
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Role of the thermophoretic force on the transport of nanoparticles in dusty silane plasmas, Physical Review E 671 (2005)
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Investigation of growth mechanisms of clusters in a silane discharge with the use of a fluid model, IEEE Transactions on Plasma Science 232 (2004) 691-698.
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Numerical investigation of particle formation mechanisms in silane discharges, Physical Review E 569 (2004)
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Modeling of the formation and transport of nanoparticles in silane plasmas, Physical Review E 570 (2004)
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A one-dimensional fluid model for an acetylene RF discharge: A study of the plasma chemistry, IEEE Transactions on Plasma Science 431 (2003) 659-664.
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Improved hybrid Monte Carlo-fluid model for the electrical characteristics in an analytical radio-frequency glow discharge in argon, Journal of Analytical Atomic Spectrometry 716 (2001) 750-755.
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Kinetic modeling of relaxation phenomena after photodetachment in a rf electronegative SiH4 discharge, Physical Review E 263 (2001)
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One-dimensional fluid model for an rf methane plasma of interest in deposition of diamond-like carbon layers, Journal of Applied Physics 290 (2001) 570-579.
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Spatial behavior of energy relaxation of electrons in capacitively coupled discharges: Comparison between Ar and SiH4, Journal of Applied Physics 887 (2000) 3628-3636.
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