Publications

Export 14 results:
Author Title Type [ Year(Asc)]
Filters: Keyword is DEPOSITION  [Clear All Filters]
2011
H.JN van Eck, T.AR Hansen, A.W Kleyn, H.J van der Meiden, D.C. Schram, P.AZeijlma van EmmichovenA differentially pumped argon plasma in the linear plasma generator Magnum-PSI: gas flow and dynamics of the ionized fraction, Plasma Sources Sci. Technol. 20 (2011) 045016.
M. Saadaoui, H. van Zeijl, W.HA Wien, H.TM Pham, C. Kwakernaak, H.CM Knoops, W.MM Kessels, R. van de Sanden, F.C Voogt, F. Roozeboom et al.Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined with LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating, IEEE Trans. Compon. Pack. Manuf. Technol. 1 (2011) 1728-1738.
A.C Bronneberg, A.HM Smets, M. Creatore, M.CM van de SandenOn the oxidation mechanism of microcrystalline silicon thin films studied by Fourier transform infrared spectroscopy, J. Non-Cryst. Solids 357 (2011) 884-887.
M. Rubel, D. Ivanova, J.P Coad, G. De Temmerman, J. Likonen, L. Marot, A. Schmidt, A. WiddowsonOverview of the second stage in the comprehensive mirrors test in JET, Phys. Scr. T145 (2011) 014070.
OA 
F.L Tabares, J.A Ferreira, A. Ramos, D. Alegre, G.J van Rooij, J. Westerhout, R. Al, J. Rapp, A. Drenik, M. MozeticTritium control techniques in ITER by ammonia injection, J. Nucl. Mater. 1415 (2011) S793-S796.
H.B Profijt, S.E Potts, M.CM van de Sanden, W.MM KesselsPlasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges, J. Vac. Sci. Technol. A 29 (2011) 26.
G. Dingemans, M.CM van de Sanden, W.MM KesselsExcellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film, Phys. Status Solidi-Rapid Res. Lett. 5 (2011) 22-24.
M. Meier, S. Muthmann, A.J Flikweert, G. Dingemans, M.CM van de Sanden, A. GordijnIn-situ transmission measurements as process control for thin-film silicon solar cells, Sol. Energy Mater. Sol. Cells 95 (2011) 3328-3332.