Publications
Expanding Thermal Plasma Deposition of Al-Doped ZnO: On the Effect of the Plasma Chemistry on Film Growth Mechanisms, Plasma Processes Polym. 13 (2016) 54-69.
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Improved conductivity of aluminum-doped ZnO: The effect of hydrogen diffusion from a hydrogenated amorphous silicon capping layer, J. Appl. Phys. 111 (2012) 063715.
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Real time in situ spectroscopic ellipsometry of the growth and plasmonic properties of au nanoparticles on SiO2, Nano Res. 5 (2012) 513-520.
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A differentially pumped argon plasma in the linear plasma generator Magnum-PSI: gas flow and dynamics of the ionized fraction, Plasma Sources Sci. Technol. 20 (2011) 045016.
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Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined with LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating, IEEE Trans. Compon. Pack. Manuf. Technol. 1 (2011) 1728-1738.
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On the oxidation mechanism of microcrystalline silicon thin films studied by Fourier transform infrared spectroscopy, J. Non-Cryst. Solids 357 (2011) 884-887.
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Overview of the second stage in the comprehensive mirrors test in JET, Phys. Scr. T145 (2011) 014070.
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Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges, J. Vac. Sci. Technol. A 29 (2011) 26.
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Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film, Phys. Status Solidi-Rapid Res. Lett. 5 (2011) 22-24.
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In-situ transmission measurements as process control for thin-film silicon solar cells, Sol. Energy Mater. Sol. Cells 95 (2011) 3328-3332.
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First Mirrors Test in JET for ITER: An overview of optical performance and surface morphology, Nucl. Instrum. Methods Phys. Res. Sect. A-Accel. Spectrom. Dect. Assoc. Equip. 2623 (2010) 818-822.
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Suppression of Tritium Retention in Remote Areas of ITER by Nonperturbative Reactive Gas Injection, Phys. Rev. Lett. 17105 (2010) 4.
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