Publications

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2016
B.L Williams, M.V Ponomarev, M.A Verheijen, H.CM Knoops, A. Chandramohan, L. Duval, M.CM van de Sanden, M. Creatore,  Expanding Thermal Plasma Deposition of Al-Doped ZnO: On the Effect of the Plasma Chemistry on Film Growth Mechanisms, Plasma Processes Polym. 13 (2016) 54-69.
OA 
2012
M.V Ponomarev, K. Sharma, M.A Verheijen, M.CM van de Sanden, M. Creatore,  Improved conductivity of aluminum-doped ZnO: The effect of hydrogen diffusion from a hydrogenated amorphous silicon capping layer, J. Appl. Phys. 111 (2012) 063715.
H.T Beyene, J.W Weber, M.A Verheijen, M.CM van de Sanden, M. Creatore,  Real time in situ spectroscopic ellipsometry of the growth and plasmonic properties of au nanoparticles on SiO2, Nano Res. 5 (2012) 513-520.
2011
H.JN van Eck, T.AR Hansen, A.W Kleyn, H.J van der Meiden, D.C. Schram, P.AZeijlma van Emmichoven,  A differentially pumped argon plasma in the linear plasma generator Magnum-PSI: gas flow and dynamics of the ionized fraction, Plasma Sources Sci. Technol. 20 (2011) 045016.
M. Saadaoui, H. van Zeijl, W.HA Wien, H.TM Pham, C. Kwakernaak, H.CM Knoops, W.MM Kessels, R. van de Sanden, F.C Voogt, F. Roozeboom et al.,  Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined with LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating, IEEE Trans. Compon. Pack. Manuf. Technol. 1 (2011) 1728-1738.
A.C Bronneberg, A.HM Smets, M. Creatore, M.CM van de Sanden,  On the oxidation mechanism of microcrystalline silicon thin films studied by Fourier transform infrared spectroscopy, J. Non-Cryst. Solids 357 (2011) 884-887.
M. Rubel, D. Ivanova, J.P Coad, G. De Temmerman, J. Likonen, L. Marot, A. Schmidt, A. Widdowson,  Overview of the second stage in the comprehensive mirrors test in JET, Phys. Scr. T145 (2011) 014070.
OA 
F.L Tabares, J.A Ferreira, A. Ramos, D. Alegre, G.J van Rooij, J. Westerhout, R. Al, J. Rapp, A. Drenik, M. Mozetic,  Tritium control techniques in ITER by ammonia injection, J. Nucl. Mater. 1415 (2011) S793-S796.
H.B Profijt, S.E Potts, M.CM van de Sanden, W.MM Kessels,  Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges, J. Vac. Sci. Technol. A 29 (2011) 26.
G. Dingemans, M.CM van de Sanden, W.MM Kessels,  Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film, Phys. Status Solidi-Rapid Res. Lett. 5 (2011) 22-24.
M. Meier, S. Muthmann, A.J Flikweert, G. Dingemans, M.CM van de Sanden, A. Gordijn,  In-situ transmission measurements as process control for thin-film silicon solar cells, Sol. Energy Mater. Sol. Cells 95 (2011) 3328-3332.
2010
M. Rubel, J.P Coad, G. De Temmerman, A. Hakola, D. Hole, J. Likonen, I. Uytdenhouwen, A. Widdowson,  First Mirrors Test in JET for ITER: An overview of optical performance and surface morphology, Nucl. Instrum. Methods Phys. Res. Sect. A-Accel. Spectrom. Dect. Assoc. Equip. 2623 (2010) 818-822.
F.L Tabares, J.A Ferreira, A. Ramos, G.J van Rooij, J. Westerhout, R. Al, J. Rapp, A. Drenik, M. Mozetic,  Suppression of Tritium Retention in Remote Areas of ITER by Nonperturbative Reactive Gas Injection, Phys. Rev. Lett. 17105 (2010) 4.
2008
F. Gou, L.T Zen, C.L Meng,  Molecular dynamics simulations of CF3 etching of SiC, Thin Solid Films 8516 (2008) 1832-1837.