Publications

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2013
R. Sobierajski, R.A Loch, R.WE van de Kruijs, E. Louis, G. von Blanckenhagen, E.M Gullikson, F. Siewert, A. Wawro, F. Bijkerk,  Mo/Si multilayer-coated amplitude-division beam splitters for XUV radiation sources, J. Synchrotron Rad. 20 (2013) 249-257.
OA 
2012
A.JR van den Boogaard, F.A van Goor, E. Louis, F. Bijkerk,  Wavelength separation from extreme ultraviolet mirrors using phaseshift reflection, Opt. Lett. 237 (2012) 160-162.
S. Bruijn, R.WE van de Kruijs, A.E Yakshin, F. Bijkerk,  Ion assisted growth of B4C diffusion barrier layers in Mo/Si multilayered structures, J. Appl. Phys. 111 (2012) 064303.
2011
J.Q Chen, E. Louis, R. Harmsen, T. Tsarfati, H. Wormeester, M. van Kampen, W. van Schaik, R. van de Kruijs, F. Bijkerk,  In situ ellipsometry study of atomic hydrogen etching of extreme ultraviolet induced carbon layers, Appl. Surf. Sci. 258 (2011) 7-12.
A.JR van den Boogaard, E. Louis, E. Zoethout, K.A Goldberg, F. Bijkerk,  Characterization of Mo/Si multilayer growth on stepped topographies, J. Vac. Sci. Technol. B 29 (2011) 6.
OA 
S. Bruijn, R.WE van de Kruijs, A.E Yakshin, F. Bijkerk,  In-situ study of the diffusion-reaction mechanism in Mo/Si multilayered films, Appl. Surf. Sci. 257 (2011) 2707-2711.
2010
N. Bertelli, A.A Balakin, E. Westerhof, M.N Buyanova,  ECCD calculations in ITER by means of the quasi-optical code, Nucl. Fusion 1150 (2010) 10.
2009
T. Tsarfati, E. Zoethout, R.WE van de Kruijs, F. Bijkerk,  Atomic O and H exposure of C-covered and oxidized d-metal surfaces, Surf. Sci. 16603 (2009) 2594-2599.
I. Nedelcu, R.WE van de Kruijs, A.E Yakshin, F. Bijkerk,  Microstructure of Mo/Si multilayers with B4C diffusion barrier layers, Appl. Optics 248 (2009) 155-160.
R.A Loch, A. Levy, T. Ceccotti, F. Quere, C. Thaury, H. George, F. Bijkerk, K.J Boller, P. Martin,  Enhanced ion acceleration with extremely thin foils, Eur. Phys. J.-Spec. Top. 175 (2009) 133-138.
2008
I. Nedelcu, R de Kruijs, A.E Yakshin, F. Bijkerk,  Thermally enhanced interdiffusion in Mo/Si multilayers, J. Appl. Phys. 8103 (2008) 6.