DIFFER

F. Bijkerk

First name
F.
Last name
Bijkerk
van der Horst, R. M., Beckers, J. ., Osorio, E. A., Astakhov, D. I., Goedheer, W. J., Lee, C. J., … Banine, V. . (2016). Exploring the electron density in plasma induced by EUV radiation: I. Experimental study in hydrogen. Journal of Physics D: Applied Physics, 49(14), 145203. https://doi.org/10.1088/0022-3727/49/14/145203
Astakhov, D. I., Goedheer, W. J., Lee, C. J., Ivanov, V. V., Krivtsun, V. M., Koshelev, K. N., … Bijkerk, F. . (2016). Exploring the electron density in plasma induced by EUV radiation: II. Numerical studies in argon and hydrogen. Journal of Physics D: Applied Physics, 49(29), 295204. https://doi.org/10.1088/0022-3727/49/29/295204
Zoethout, E. ., Louis, E. ., & Bijkerk, F. . (2016). In depth study of molybdenum silicon compound formation at buried interfaces. Journal of Applied Physics, 120(11), 115303. https://doi.org/10.1063/1.4962541
Astakhov, D. I., Goedheer, W. J., Lee, C. J., Ivanov, V. V., Krivtsun, V. M., Zotovich, A. I., … Bijkerk, F. . (2015). Plasma probe characteristics in low density hydrogen pulsed plasmas. Plasma Sources Science and Technology, 24(5), 055018. https://doi.org/10.1088/0963-0252/24/5/055018
Dolgov, A. ., Lopaev, D. ., Lee, C. J., Zoethout, E. ., Medvedev, V. ., Yakushev, O. ., & Bijkerk, F. . (2015). Characterization of carbon contamination under ion and hot atom bombardment in a tin-plasma extreme ultraviolet light source. Applied Surface Science, 353, 708-713. https://doi.org/10.1016/j.apsusc.2015.06.079 (Original work published)
Medvedev, V. V., Yang, J. ., Schmidt, A. J., Yakshin, A. E., van de Kruijs, R. W. E., Zoethout, E. ., & Bijkerk, F. . (2015). Anisotropy of heat conduction in Mo/Si multilayers. Journal of Applied Physics, 118(8), 085101. https://doi.org/10.1063/1.4928958
Yakunin, S. N., Makhotkin, I. A., van de Kruijs, R. W. E., Chuev, M. A., Pashaev, E. ., Zoethout, E. ., … Kovalchuk, M. V. (2014). Model independent X-ray standing wave analysis of periodic multilayer structures. Journal of Applied Physics, 115(13), 134303. https://doi.org/10.1063/1.4869540 (Original work published)
Bayraktar, M. ., van Goor, F. A., Boller, K. J., & Bijkerk, F. . (2014). Spectral purification and infrared light recycling in extreme ultraviolet lithography sources. Optics Express, 22(7), 8633-8639. https://doi.org/10.1364/oe.22.008633 (Original work published)
Huber, S. P., van de Kruijs, R. W. E., Yakshin, A. E., Zoethout, E. ., Boller, K.-J. ., & Bijkerk, F. . (2014). Subwavelength single layer absorption resonance antireflection coatings. Optics Express, 22, 490–497. https://doi.org/10.1364/OE.22.000490 (Original work published 2025)
Dolgov, A. ., Lopaev, D. ., Rachimova, T. ., Kovalev, A. ., Vasil’Eva, A. ., Lee, C. J., … Bijkerk, F. . (2014). Comparison of H2 and He carbon cleaning mechanisms in extreme ultraviolet induced and surface wave discharge plasmas. Journal of Physics D: Applied Physics, 47(6), 065205. https://doi.org/10.1088/0022-3727/47/6/065205