Gordijn, A. ., Vanecek, M. ., Goedheer, W. J., Rath, J. ., & Schropp, R. E. I. (2006). Influence of pressure and plasma potential on high growth rate microcrystalline silicon grown by very high frequency plasma enhanced chemical vapour deposition. Japanese Journal of Applied Physics Part 1-Regular Papers Brief Communications & Review Papers, 45, 6166-6172. Retrieved from <Go to ISI>://000240512800022 (Original work published 2025)
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