DIFFER
DIFFER Publication
Influence of pressure and plasma potential on high growth rate microcrystalline silicon grown by very high frequency plasma enhanced chemical vapour deposition
| Label | Value |
|---|---|
| Author | |
| Year of Publication |
2006
|
| Journal |
Japanese Journal of Applied Physics Part 1-Regular Papers Brief Communications & Review Papers
|
| Volume |
45
|
| Number |
8A
|
| Number of Pages |
6166-6172
|
| Date Published |
08/2006
|
| ISBN Number |
0021-4922
|
| Accession Number |
ISI:000240512800022
|
| URL | |
| PId |
5a78fa8563e665a400a68c57f81f12a7
|
Journal Article
|
|
| Download citation |
Citation
Gordijn, A., Vanecek, M., Goedheer, W. J., Rath, J., & Schropp, R. E. I. (2006). Influence of pressure and plasma potential on high growth rate microcrystalline silicon grown by very high frequency plasma enhanced chemical vapour deposition. Japanese Journal of Applied Physics Part 1-Regular Papers Brief Communications & Review Papers, 45, 6166-6172. Retrieved from <Go to ISI>://000240512800022 (Original work published 2006)