Alink, L. ., de Kruijs, R. ., Louis, E. ., Bijkerk, F. ., & Verhoeven, J. . (2006). Improved temperature stability of Mo/Si multilayers by carbide based diffusion barriers through implantation of low energy CHx+ ions. Thin Solid Films, 510, 26-31. Retrieved from <Go to ISI>://000238011200005 (Original work published 2025)
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