R.W.E. de Kruijs

Alink, L., de Kruijs, R., Louis, E., Bijkerk, F., & Verhoeven, J. (2006). Improved temperature stability of Mo/Si multilayers by carbide based diffusion barriers through implantation of low energy CHx+ ions. Thin Solid Films, 510, 26-31. Retrieved from <Go to ISI>://000238011200005 (Original work published 2025)